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Investigation of structural development in the two-step diffusion coating of Nb3Sn on niobium

Conference ·
 [1];  [2];  [1];  [3];  [4]
  1. Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)
  2. College of William and Mary, Williamsburg, VA (United States)
  3. Virginia Polytechnic Inst. and State Univ. (Virginia Tech), Blacksburg, VA (United States)
  4. College of William and Mary, Williamsburg, VA (United States); Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States); Virginia Polytechnic Inst. and State Univ. (Virginia Tech), Blacksburg, VA (United States)
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The potential for higher operating temperatures and increased accelerating gradient has attracted SRF researchers to Nb3Sn coatings on niobium or other substrates for nearly 50 years. Its seeming simplicity has made the two-step tin vapor diffusion process the leading candidate, despite the almost universal finding of quality factor of coated cavities falling with increasing gradient. We have undertaken a fundamental materials study of the nucleation and deposition steps. Nucleation was accomplished within the usual parameter range: 400oC ? 500oC, 1-5 hours duration, 10 mg to 1 g SnCl2 and 1-3 g Sn. The resulting deposit consists of a low (< 10% ) coverage of micron-sized tin particles by SEM/EDS and a high (> 50%) coverage of few nm thick tin film by XPS and Scanning Auger Microscopy. The crystallography by EBSD and the topography of the substrate by AFM and SEM had no evident effect on the nucleation or the final film.
Research Organization:
Thomas Jefferson National Accelerator Facility, Newport News, VA (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Nuclear Physics (NP)
DOE Contract Number:
AC05-06OR23177
OSTI ID:
1987323
Report Number(s):
JLAB-ACC-16-2391; DOE/OR/23177-6558
Country of Publication:
United States
Language:
English

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