Pulsed-Beam Transmission Electron Microscopy and Radiation Damage

Flannigan, David J.; VandenBussche, Elisah J.

doi:10.1016/j.micron.2023.103501

Pulsed-Beam Transmission Electron Microscopy and Radiation Damage

Journal Article · Sat Jun 24 00:00:00 EDT 2023 · Micron

DOI:https://doi.org/10.1016/j.micron.2023.103501· OSTI ID:1986546

^[1]; VandenBussche, Elisah J. ^[2]

University of Minnesota, Minneapolis, MN (United States); University of Minnesota
University of Minnesota, Minneapolis, MN (United States)

Here, we review the use of pulsed electron-beams in transmission electron microscopes (TEMs) for the purpose of mitigating specimen damage. We begin by placing the importance of TEMs with respect to materials characterization into proper context, and we provide a brief overview of established methods for reducing or eliminating the deleterious effects of beam-induced damage. We then introduce the concept of pulsed-beam TEM, and we briefly describe the basic methods and instrument configurations used to create so-called temporally structured electron beams. Following a brief overview of the use of high-dose-rate pulsed-electron beams in cancer radiation therapy, we review historical speculations and more recent compelling but mostly anecdotal findings of a pulsed-beam TEM damage effect. This is followed by an in-depth technical review of recent works seeking to establish cause-and-effect relationships, to conclusively uncover the presence of an effect, and to explore the practicality of the approach. These studies, in particular, provide the most compelling evidence to date that using a pulsed electron beam in the TEM is indeed a viable way to mitigate damage. Throughout, we point out current gaps in understanding, and we conclude with a brief perspective of current needs and future directions.

View Accepted Manuscript (DOE)

Research Organization:: University of Minnesota, Minneapolis, MN (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: SC0018204

OSTI ID:: 1986546

Alternate ID(s):: OSTI ID: 1987756

Journal Information:: Micron, Journal Name: Micron Vol. 172; ISSN 0968-4328

Publisher:: ElsevierCopyright Statement

Country of Publication:: United States

Language:: English

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