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Title: Ion Beam Figuring System for Synchrotron X-Ray Mirrors Achieving Sub-0.2-µrad and Sub-0.5-nm Root Mean Square

Journal Article · · Nanomanufacturing and Metrology
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Abstract Optics with high-precision height and slope are increasingly desired in numerous industrial fields. For instance, Kirkpatrick–Baez (KB) mirrors play an important role in synchrotron X-ray applications. A KB system is composed of two aspherical, grazing-incidence mirrors used to focus an X-ray beam. The fabrication of KB mirrors is challenging due to the aspherical departure of the mirror surfaces from base geometries and the high-quality requirements for slope and height residuals. In this paper, we present the process of manufacturing an elliptical cylinder KB mirror using our in-house-developed ion beam figuring (IBF) and metrology technologies. First, the key aspects of figuring and finishing processes with IBF are illustrated in detail. The effect of positioning error on the convergence of the residual slope error is highlighted and compensated. Finally, inspection and cross-validation using different metrology instruments are performed and used as the final validation of the mirror. Results confirm that relative to the requested off-axis ellipse, the mirror has achieved 0.15-µrad root mean square (RMS) and 0.36-nm RMS residual slope and height errors, respectively, while maintaining the initial 0.3-nm RMS microroughness.

Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
BNL LDRD 17-016; FWP PS032; SC0012704
OSTI ID:
1983981
Journal Information:
Nanomanufacturing and Metrology, Journal Name: Nanomanufacturing and Metrology Vol. 6 Journal Issue: 1; ISSN 2520-811X
Publisher:
Springer Science + Business MediaCopyright Statement
Country of Publication:
Country unknown/Code not available
Language:
English

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