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MAGNETRON SPUTTERING OF Nb3Sn FOR SRF CAVITIES

Conference ·
 [1];  [1];  [2];  [3];  [4];  [4]
  1. Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)
  2. College of William and Mary, Williamsburg, VA (United States)
  3. College of William and Mary, Williamsburg, VA (United States); Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States); Virginia Polytechnic Inst. and State Univ. (Virginia Tech), Blacksburg, VA (United States)
  4. Old Dominion Univ., Norfolk, VA (United States)
Nb3Sn is a potential candidate for surface material of SRF cavities since it can enable the cavity to operate at higher temperatures with high quality factor and at an increased accelerating gradient. Nb-Sn films were deposited using magnetron sputtering of individual Nb and Sn targets onto Nb and sapphire substrates. The as-deposited films were annealed at 1200 °C for 3 hours. The films were characterized for their structure by X-ray Diffraction (XRD), morphology by Field Emission Scanning Electron Microscopy (FESEM), and composition by Energy Dispersive X-ray Spectroscopy (EDS) and Time of Flight Secondary Ion Mass Spectrometry (ToF-SIMS). The surface resistivity was measured down to cryogenic temperature to determine the superconducting transition temperature and its width. The composition of the multilayered films was controlled by varying the thickness of the Nb and Sn layers. The films showed crystalline Nb3Sn phases with Tc up to 17.6 K.
Research Organization:
Thomas Jefferson National Accelerator Facility, Newport News, VA (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Nuclear Physics (NP)
DOE Contract Number:
AC05-06OR23177
OSTI ID:
1983637
Report Number(s):
JLAB-ACC-18-2723; DOE/OR/23177-6301
Country of Publication:
United States
Language:
English

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