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A self-consistent hybrid model of kinetic striations in low-current argon discharges

Journal Article · · Plasma Sources Science and Technology

A self-consistent hybrid model of standing and moving striations was developed for low-current DC discharges in noble gases. We introduced the concept of surface diffusion in phase space (r,u) (where u denotes the electron kinetic energy) described by a tensor diffusion in the nonlocal Fokker–Planck kinetic equation for electrons in the collisional plasma. Electrons diffuse along surfaces of constant total energy ε = u - eφ(r) between energy jumps in inelastic collisions with atoms. Numerical solutions of the 1d1u kinetic equation for electrons were obtained by two methods and coupled to ion transport and Poisson solver. We studied the dynamics of striation formation in Townsend and glow discharges in argon gas at low discharge currents using a two-level excitation-ionization model and a ‘full-chemistry’ model, which includes stepwise and Penning ionization. Standing striations appeared in Townsend and glow discharges at low currents, and moving striations were obtained for the discharge currents exceeding a critical value. These waves originate at the anode and propagate towards the cathode. We have seen two types of moving striations with the two-level and full-chemistry models, which resemble the s and p striations previously observed in the experiments. Simulations indicate that processes in the anode region could control moving striations in the positive column plasma. The developed model helps clarify the nature of standing and moving striations in DC discharges of noble gases at low discharge currents and low gas pressures.

Research Organization:
Univ. of Alabama, Huntsville, AL (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
DOE Contract Number:
SC0021391
OSTI ID:
1979313
Journal Information:
Plasma Sources Science and Technology, Vol. 31, Issue 3; ISSN 0963-0252
Publisher:
IOP Publishing
Country of Publication:
United States
Language:
English

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