Ellipticity controlled dissociative double ionization of ethane by strong fields

Basnayake, Gihan; Hoerner, Paul; Mignolet, Benoit; Lee, Mi Kyung; Lin, Yun Fei; Winney, Alexander H.; Debrah, Duke A.; Popaj, Leon; Shi, Xuetao; Lee, Suk Kyoung; Schlegel, H. Bernhard; Remacle, Francoise; Li, Wen

doi:10.1039/d1cp03585a

Ellipticity controlled dissociative double ionization of ethane by strong fields

Journal Article · Fri Oct 08 00:00:00 EDT 2021 · Physical Chemistry Chemical Physics. PCCP

DOI:https://doi.org/10.1039/d1cp03585a· OSTI ID:1978759

Basnayake, Gihan ^[1]; Hoerner, Paul ^[1]; ^[2]; Lee, Mi Kyung ^[1]; Lin, Yun Fei ^[1]; Winney, Alexander H. ^[1]; Debrah, Duke A. ^[1]; Popaj, Leon ^[1]; Shi, Xuetao ^[1]; Lee, Suk Kyoung ^[1]; ^[1]; Remacle, Francoise ^[2]; ^[1]

Wayne State University, Detroit, MI (United States)
University of Liege, (Belgium)

We report the yields of all dissociation channels of ethane dications produced by strong field double ionization were measured. It was found that the branching ratios can be controlled by varying the ellipticity of laser pulses. The CH₃⁺ formation and H⁺ formation channels show a clear competition, producing the highest and lowest branching ratios at ellipticity of ~0.6, respectively. With the help of theoretical calculations, such a control was attributed to the ellipticity dependent yields of different sequential ionization pathways.

View Accepted Manuscript (DOE)

Research Organization:: Wayne State University, Detroit, MI (United States)

Sponsoring Organization:: Fonds National de la Recherche Scientifique; Intensive Computing Equipment Consortium (CECI); USDOE; USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: SC0020994

Other Award/Contract Number:: T.0132.16
2.5020.11

OSTI ID:: 1978759

Alternate ID(s):: OSTI ID: 1825817

Journal Information:: Physical Chemistry Chemical Physics. PCCP, Journal Name: Physical Chemistry Chemical Physics. PCCP Journal Issue: 41 Vol. 23; ISSN 1463-9076

Publisher:: Royal Society of ChemistryCopyright Statement

Country of Publication:: United States

Language:: English

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