Atmospheric RF plasma coating of indium and tin oxide films

Book · Sun Dec 31 04:00:00 EST 1995

OSTI ID:197635

Williams, J A.A.; Lee, D H; Vuong, K D; Tenpas, E; Wu, V; Moss, R; Condrate, Sr, R A; Wang, X W ^[1]

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1. Alfred Univ., NY (United States)

Indium tin oxide (ITO) thin films on soda-lime-silicate (SLS) and silica glasses were fabricated using an RF plasma mist deposition process. SEM analysis showed that the ITO films consisted of uniform particle size with a size ranging from 50 to 200 nm. XRD revealed that In{sub 2}O{sub 3} phase is present in the film when In : Sn ratio is 5 : 5 and higher. The resistivity of the ITO films was between 1--10 ohm-cm. The structural change near the surface of the glass was investigated by DRIFT (Diffuse reflectance infrared Fourier transform) spectroscopy. The infrared results indicated that the structure near the surface was significantly changed with higher indium concentration. The coating materials create non-bridging oxygen near the surfaces. The effects of deposition time and substrate temperature were also studied. Applications of such coatings are conductive filters for use as shields against low frequency interference, flat panel liquid crystal displays, anti-static packaging, heat reflector, resistive heaters to defrost auto windshields, and electrochromic ``smart windows`` which can be utilized to regulate temperature in homes and automobiles.

• OSTI ID: 197635
• Report Number(s): CONF-950793--; ISBN 0-8194-1890-0
• Country of Publication: United States
• Language: English

Related Subjects

32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
36 MATERIALS SCIENCE
AUTOMOBILES
BUILDINGS
CHEMICAL REACTORS
CHEMICAL VAPOR DEPOSITION
ELECTROCHROMISM
ENERGY CONSERVATION
EXPERIMENTAL DATA
INDIUM OXIDES
INTERFACES
MICROSTRUCTURE
SCANNING ELECTRON MICROSCOPY
TIN OXIDES
WINDOWS