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Title: Twin suppression effect of dihydroxy-benzene isomers during the secondary growth of b -oriented zeolite MFI nanosheet films

Journal Article · · CrystEngComm
DOI:https://doi.org/10.1039/D2CE01407F· OSTI ID:1969779
 [1]; ORCiD logo [2];  [3];  [3];  [4]; ORCiD logo [3];  [1]; ORCiD logo [5];  [6]
  1. Nanchang Key Laboratory of Photoelectric Conversion and Energy Storage Materials, College of Science, Nanchang Institute of Technology, Nanchang 330099, PR China
  2. Nanchang Key Laboratory of Photoelectric Conversion and Energy Storage Materials, College of Science, Nanchang Institute of Technology, Nanchang 330099, PR China, Department of Chemical and Biomolecular Engineering, and Institute for NanoBio Technology, Johns Hopkins University, Baltimore, MD 21218, USA
  3. Department of Chemical and Biomolecular Engineering, and Institute for NanoBio Technology, Johns Hopkins University, Baltimore, MD 21218, USA
  4. Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455, USA
  5. College of Chemical and Biological Engineering, Zhejiang University, Hangzhou 310027, PR China
  6. Department of Chemical and Biomolecular Engineering, and Institute for NanoBio Technology, Johns Hopkins University, Baltimore, MD 21218, USA, Applied Physics Laboratory, Johns Hopkins University, Laurel, MD 20723, USA

MFI twin crystals on b -axis oriented zeolite MFI nanosheet films were suppressed in the presence of dihydroxybenzene isomers. The resulting films presented an ultra-thin grain thickness of 30–45 nm within hours.

Sponsoring Organization:
USDOE
Grant/Contract Number:
SC0023403
OSTI ID:
1969779
Journal Information:
CrystEngComm, Journal Name: CrystEngComm Vol. 25 Journal Issue: 16; ISSN 1466-8033
Publisher:
Royal Society of Chemistry (RSC)Copyright Statement
Country of Publication:
United Kingdom
Language:
English

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