Enabling High Precision Gradient Index Control in Subsurface Multiphoton Lithography

Littlefield, Alexander J.; Xie, Dajie; Richards, Corey A.; Ocier, Christian R.; Gao, Haibo; Messinger, Jonah F.; Ju, Lawrence; Gao, Jingxing; Edwards, Lonna; Braun, Paul V.; Goddard, Lynford L.

doi:10.1021/acsphotonics.2c01950

Enabling High Precision Gradient Index Control in Subsurface Multiphoton Lithography

Journal Article · Wed Mar 29 00:00:00 EDT 2023 · ACS Photonics

DOI:https://doi.org/10.1021/acsphotonics.2c01950· OSTI ID:1963961

^[1]; ^[2]; ^[2]; Ocier, Christian R. ^[2]; ^[2]; ^[3]; Ju, Lawrence ^[1]; ^[1]; Edwards, Lonna ^[1]; ^[4]; ^[5]

Department of Electrical and Computer Engineering, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States, Nick Holonyak, Jr., Micro and Nanotechnology Laboratory, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States
Department of Materials Science and Engineering, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States, Materials Research Laboratory, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States, Beckman Institute for Advanced Science and Technology, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States
Materials Research Laboratory, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States, Beckman Institute for Advanced Science and Technology, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States, Department of Physics, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States
Nick Holonyak; Jr.; Micro and Nanotechnology Laboratory; University of Illinois Urbana-Champaign; Urbana; Illinois 61801; United States; Department of Materials Science and Engineering; University of Illinois Urbana-Champaign; Urbana; Illinois 61801; United States; Materials Research Laboratory; University of Illinois Urbana-Champaign; Urbana; Illinois 61801; United States; Beckman Institute for Advanced Science and Technology; University of Illinois Urbana-Champaign; Urbana; Illinois 61801; United States; Department of Mechanical Science and Engineering; University of Illinois Urbana-Champaign; Urbana; Illinois 61801; United States
Department of Electrical and Computer Engineering, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States, Nick Holonyak, Jr., Micro and Nanotechnology Laboratory, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States, Beckman Institute for Advanced Science and Technology, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States

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Research Organization:: University of Illinois at Urbana-Champaign, IL (United States)

Sponsoring Organization:: National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: SC0019140

OSTI ID:: 1963961

Alternate ID(s):: OSTI ID: 2001042

Journal Information:: ACS Photonics, Journal Name: ACS Photonics Journal Issue: 9 Vol. 10; ISSN 2330-4022

Publisher:: American Chemical SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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Enabling High Precision Gradient Index Control in Subsurface Multiphoton Lithography

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