Ultrafast extreme-ultraviolet ARPES studies of electronic dynamics in two-dimensional materials

Buss, Jan Heye; Maklar, Julian; Joucken, Frédéric; Wang, He; Xu, Yiming; Mo, Sung-Kwan; Lanzara, Alessandra; Kaindl, Robert A.

doi:10.1117/12.2251249

Ultrafast extreme-ultraviolet ARPES studies of electronic dynamics in two-dimensional materials

Conference · Wed Feb 22 23:00:00 EST 2017 · Proceedings of SPIE - The International Society for Optical Engineering

DOI:https://doi.org/10.1117/12.2251249· OSTI ID:1963411

Buss, Jan Heye ^[1]; Maklar, Julian ^[1]; Joucken, Frédéric ^[1]; Wang, He ^[1]; Xu, Yiming ^[1]; Mo, Sung-Kwan ^[1]; Lanzara, Alessandra ^[1]; Kaindl, Robert A. ^[1]

Lawrence Berkeley National Lab. (United States)

The intriguing electronic properties of two-dimensional materials motivates experiments to resolve their rapid, microscopic interactions and dynamics across momentum space. Essential insight into the electronic momentum-space dynamics can be obtained directly via time- and angle-resolved photoemission spectroscopy (trARPES). We discuss the development of a high-repetition rate trARPES setup that employs a bright source of narrowband, extreme-UV harmonics around 22.3 eV, and its application to sensitive studies of materials dynamics. In the bulk transition-metal dichalcogenide MoSe2 momentum-space quasiparticle scattering is observed after resonant excitation at the K-point exciton line, resulting in the time-delayed buildup of electrons at the Σ-point conduction band minimum. We will discuss this and other aspects of the non-equilibrium electronic response accessible with the extreme-UV trARPES probe.

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Research Organization:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

DOE Contract Number:: AC02-05CH11231

OSTI ID:: 1963411

Journal Information:: Proceedings of SPIE - The International Society for Optical Engineering, Journal Name: Proceedings of SPIE - The International Society for Optical Engineering; ISSN 0277-786X

Publisher:: SPIE

Country of Publication:: United States

Language:: English

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