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Synthesis and electrical behavior of VO2 thin films grown on SrRuO3 electrode layers

Journal Article · · Journal of Vacuum Science and Technology A
DOI:https://doi.org/10.1116/6.0001798· OSTI ID:1961586
 [1];  [2];  [3];  [3];  [3];  [2];  [2];  [3];  [3];  [2]
  1. Purdue Univ., West Lafayette, IN (United States); Penn State University
  2. Purdue Univ., West Lafayette, IN (United States)
  3. Pennsylvania State Univ., University Park, PA (United States)
VO2 thin films were grown on conducting oxide underlayer SrRuO3 buffered SrTiO3 (111) and Si/SiO2 substrates, respectively, using sputtering. X-ray diffraction phi-scans revealed the epitaxial nature of the VO2 films grown on SrRuO3 buffered SrTiO3 and polycrystalline structure for films grown on SrRuO3 buffered Si/SiO2. X-ray photoelectron spectroscopy confirms a dominant presence of V4+ in both films and establishes a high-quality growth of single-phase VO2 films. Temperature and electric-field driven metal-insulator-transition in both the in-plane and out-of-plane configurations were investigated. Depending on the configuration, the resistance change across the metal-insulator-transition varies from a factor of 1.57–3. The measured resistance in each state as well as the magnitude of resistance change were similar during temperature and electric-field driven metal-insulator-transition. To shed light on the suppressed metal-insulator-transition characteristics due to the current shunting effect from conducting SrRuO3 bottom electrode, a distributed resistance network model is proposed and benchmarked against reports from the literature. Here, the results demonstrate the growth of high-quality VO2 on conducting SrRuO3 layers and their electrical behavior, which is of particular interest for all-oxide electronic devices utilizing phase transitions such as resistive memory and neuromorphic oscillators.
Research Organization:
Pennsylvania State Univ., University Park, PA (United States)
Sponsoring Organization:
USDOE; USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
SC0021118
OSTI ID:
1961586
Alternate ID(s):
OSTI ID: 1873032
Journal Information:
Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Journal Issue: 4 Vol. 40; ISSN 0734-2101
Publisher:
American Vacuum Society / AIPCopyright Statement
Country of Publication:
United States
Language:
English

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  • Montero, José; Ji, Yu-Xia; Li, Shu-Yi
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