Improved selective properties of SiO{sub 2}/TiN{sub x}O{sub y}-Al tandem absorbers effected by tempering
Book
·
OSTI ID:194820
- Ludwig-Maximilians-Univ. Muenchen (Germany). Sektion Physik
- Beschleunigerlabor der LMU, Garching (Germany)
TiN{sub x}O{sub y}-Al and SiO{sub 2}/TiN{sub x}O{sub y}-Al selective absorbers, prepared in an ARE (Activated Reactive Evaporation) deposition process, have been investigated in respect of effects induced by heat treatment. Samples were exposed to residual gas atmospheres of 10{sup {minus}4} hPa and 10hPa respectively, in a temperature range of 225 C--470 C. Three different processes were observed. They were analyzed investigating optical properties, element concentration and structure of the compounds. Reflectance measurements are in agreement with calculations of the spectral reflection from known optical constants.
- OSTI ID:
- 194820
- Report Number(s):
- CONF-9404167--; ISBN 0-8194-1564-2
- Country of Publication:
- United States
- Language:
- English
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