Multilayer coatings for the EUVL front-end test bed
Conference
·
OSTI ID:192455
Good illumination uniformity at the mask and wafer planes, and high wafer thoroughput in the EUVL front-end test bed facility at LLNL require graded period multilayer (ML) coatings on several of the optics. The ML deposition was accomplished using a newly developed deposition technique which avoids the use of {open_quotes}uniformity masks{close_quotes} to define the spatial dependence of the ML period variation. The capabilities of the process in providing the specified ML coatings are discussed for both EUVL condenser and imaging systems.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 192455
- Report Number(s):
- UCRL-JC-119623; CONF-9409177-19; ON: DE96004320; TRN: 96:001578
- Resource Relation:
- Conference: Optical Society of America conference on extreme ultraviolet lithography, Monterey, CA (United States), 19-21 Sep 1994; Other Information: PBD: 19 Jan 1995
- Country of Publication:
- United States
- Language:
- English
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