Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

The growth and radiation response of n{sup +}p deep homojunction InP solar cells

Conference ·
OSTI ID:191215
 [1];  [2];  [3];  [1]; ; ; ;  [4]
  1. Univ. of Maryland, Baltimore, MD (United States)
  2. Naval Research Lab., Washington, DC (United States)
  3. SFA, Inc., Landover, MD (United States)
  4. Research Triangle Inst., Research Triangle Park, NC (United States)
InP solar cells grown by Metal Organic Chemical Vapor Deposition (MOCVD) exhibit a higher beginning of life efficiency (BOL) than InP solar cells grown by thermally diffused junctions (DJ). However, cells grown by MOCVD do not display the nearly complete recovery in photovoltaic (PV) parameters upon annealing that DJ cells do. To investigate the cause of this different behavior the Research Triangle Institute (RTI) was contracted by the Naval Research Laboratory to fabricate epitaxial MOCVD InP solar cells with nonuniform dopant profiles grown to mimic the structure of the DJ cell with the goal that these cells would also show the DJ cell`s annealing characteristics. Cells were grown on both <111>B and <100> oriented InP substrates to see if this would influence the cell`s radiation resistance. Preliminary results of the effect of 1 MeV electron irradiation on the PV parameters of both kinds of cells are presented.
OSTI ID:
191215
Report Number(s):
CONF-941203--; ISBN 0-7803-1459-X
Country of Publication:
United States
Language:
English