Strain- and thickness-dependent magnetic properties of epitaxial La0.67Sr0.33CoO3/La0.67Sr0.33MnO3 bilayers
- University of California, Davis, CA (United States)
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)
- SLAC National Accelerator Laboratory, Menlo Park, CA (United States). Stanford Synchrotron Radiation Lightsource (SSRL)
Magnetic properties and interfacial phenomena of epitaxial perovskite oxides depend sensitively on parameters such as film thickness and strain state. In this work, epitaxial La0.67Sr0.33CoO3(LSCO)/La0.67Sr0.33MnO3 (LSMO) bilayers were grown on NdGaO3 (NGO) and LaAlO3 (LAO) substrates with a fixed LSMO thickness of 6 nm, and LSCO thickness (tLSCO) varying from 2 to 10 nm. Soft x-ray magnetic spectroscopy revealed that magnetically active Co2+ions that strongly coupled to the LSMO layer were observed below a critical tLSCO for bilayers grown on both substrates. On LAO substrates, this critical thickness was 2 nm, above which the formation of Co2+ ions was quickly suppressed leaving only a soft LSCO layer with mixed valence Co3+/Co4+ ions. The magnetic properties of both LSCO and LSMO layers displayed strong tLSCO dependence. This critical tLSCOincreased to 4 nm on NGO substrates, and the magnetic properties of only the LSCO layer displayed tLSCO dependence. A non-magnetic layer characterized by Co3+ ions and with a thickness below 2 nm exists at the LSCO/substrate interface for both substrates. Therefore, the results contribute to the understanding of interfacial exchange spring behavior needed for applications in next generation spintronic and magnetic memory devices.
- Research Organization:
- SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States); Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES); National Science Foundation (NSF)
- Grant/Contract Number:
- AC02-76SF00515; AC02-05CH11231; DMR-1745450
- OSTI ID:
- 1908924
- Journal Information:
- Journal of Applied Physics, Vol. 132, Issue 19; ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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