Laser Damage Comparisons of E-Beam Evaporated HfO2/SiO2 Antireflection Coatings at 0% and 40% Relative Humidity for 532 nm and 1064 nm .
Conference
·
OSTI ID:1905972
Abstract not provided.
- Research Organization:
- Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA)
- DOE Contract Number:
- NA0003525
- OSTI ID:
- 1905972
- Report Number(s):
- SAND2021-15822C; 702328
- Country of Publication:
- United States
- Language:
- English
Similar Records
Laser Damage Comparisons of E-Beam Evaporated HfO2/SiO2 Antireflection Coatings at 0% and 40% Relative Humidity for 532 nm and 1064 nm .
The Effect of Coating System Base Pressure on the Laser Damage Threshold of HfO2/SiO2 High Reflection Coatings for 527 nm.
How reduced vacuum pumping capability in a coating chamber affects the laser damage resistance of HfO2/SiO2 antireflection and high-reflection coatings.
Conference
·
Wed Sep 01 00:00:00 EDT 2021
·
OSTI ID:1889353
The Effect of Coating System Base Pressure on the Laser Damage Threshold of HfO2/SiO2 High Reflection Coatings for 527 nm.
Conference
·
Wed Jun 01 00:00:00 EDT 2016
·
OSTI ID:1530017
How reduced vacuum pumping capability in a coating chamber affects the laser damage resistance of HfO2/SiO2 antireflection and high-reflection coatings.
Conference
·
Tue Sep 01 00:00:00 EDT 2015
·
OSTI ID:1326355