Tin removal by an annular surface wave plasma antenna in an extreme ultraviolet lithography source

Qerimi, Dren; Herschberg, Andrew C.; Panici, Gianluca; Hays, Parker; Pohlman, Tyler; Ruzic, David N.

doi:10.1063/5.0094375

Tin removal by an annular surface wave plasma antenna in an extreme ultraviolet lithography source

Journal Article · Fri Sep 16 00:00:00 EDT 2022 · Journal of Applied Physics

DOI:https://doi.org/10.1063/5.0094375· OSTI ID:1979095

^[1]; ^[2]; Panici, Gianluca ^[2]; Hays, Parker ^[2]; Pohlman, Tyler ^[2]; ^[2]

Univ. of Illinois at Urbana-Champaign, IL (United States); Univ. of Illinois at Urbana-Champaign, IL (United States)
Univ. of Illinois at Urbana-Champaign, IL (United States)

Tin contamination of the collector mirror surface remains one of the crucial issues of EUV (Extreme Ultraviolet) sources, directly impacting the availability of the tool. Hydrogen plasma-based tin removal processes employ hydrogen radicals and ions to interact with tin deposits to form gaseous tin hydride (SnH₄), which can be removed through pumping. An annular surface wave plasma (SWP) source developed at the University of Illinois—Urbana Champaign is integrated into the cone and perimeter of the collection mirror for in situ tin removal. The SWP is characterized by high ion and radical densities, low electron temperature, and local generation where etching is needed. This method has the potential to significantly reduce downtime and increase mirror lifetime. Radical probe measurements show hydrogen radical densities in the order of 10¹⁹m^-3, while Langmuir probe measurements show electron temperatures of up to 6 eV and plasma densities on the order of 10^17–18m^-3. The generated ions are essential to the tin cleaning and have sufficiently low energy to cause no damage to the collector capping layer. Tin etch rates of up to 270 nm/min were observed in a variety of experimental conditions, including various powers, pressures, flowrates, and temperatures. In conclusion, the high etch rates demonstrated in this study exceed the expected contamination rate of the EUV source.

View Accepted Manuscript (DOE)

Research Organization:: Univ. of Illinois at Urbana-Champaign, IL (United States)

Sponsoring Organization:: USDOE; USDOE Office of Science (SC)

Grant/Contract Number:: FG02-07ER46453; FG02-07ER46471

OSTI ID:: 1979095

Alternate ID(s):: OSTI ID: 1887630

Journal Information:: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 132; ISSN 0021-8979

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

References (29)

Principles of Plasma Discharges and Materials Processing Lieberman, Michael A.; Lichtenberg, Allan J. https://doi.org/10.1002/0471724254	book	January 2005
X-Ray Interactions: Photoabsorption, Scattering, Transmission, and Reflection at E = 50-30,000 eV, Z = 1-92 Henke, B. L.; Gullikson, E. M.; Davis, J. C. Atomic Data and Nuclear Data Tables, Vol. 54, Issue 2, p. 181-342 https://doi.org/10.1006/adnd.1993.1013	journal	July 1993
Emission characteristics of debris from CO2 and Nd:YAG laser-produced tin plasmas for extreme ultraviolet lithography light source Takahashi, A.; Nakamura, D.; Tamaru, K. Applied Physics B, Vol. 92, Issue 1 https://doi.org/10.1007/s00340-008-3068-5	journal	June 2008
Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching Elg, Daniel T.; Panici, Gianluca A.; Liu, Sumeng Plasma Chemistry and Plasma Processing, Vol. 38, Issue 1 https://doi.org/10.1007/s11090-017-9852-4	journal	October 2017
Ionization by a pulsed plasma surface wave Bloyet, E.; Leprince, P.; Blasco, M. Llamas Physics Letters A, Vol. 83, Issue 8 https://doi.org/10.1016/0375-9601(81)90525-9	journal	June 1981
Sn etching with hydrogen radicals to clean EUV optics van Herpen, M. M. J. W.; Klunder, D. J. W.; Soer, W. A. Chemical Physics Letters, Vol. 484, Issue 4-6 https://doi.org/10.1016/j.cplett.2009.11.030	journal	January 2010
EUV lithography Kemp, Kevin; Wurm, Stefan Comptes Rendus Physique, Vol. 7, Issue 8 https://doi.org/10.1016/j.crhy.2006.10.002	journal	October 2006
Interface-engineered EUV multilayer mirrors Yulin, Sergiy; Benoit, Nicolas; Feigl, Torsten Microelectronic Engineering, Vol. 83, Issue 4-9 https://doi.org/10.1016/j.mee.2006.01.126	journal	April 2006
Global solutions of Maxwell's equations in an electromagnetic field with a temperature-dependent electrical conductivity Yin, Hong-Ming European Journal of Applied Mathematics, Vol. 5, Issue 1 https://doi.org/10.1017/S0956792500001297	journal	March 1994
Atom and Ion Chemistry in Low Pressure Hydrogen DC Plasmas Méndez, I.; Gordillo-Vázquez, F. J.; Herrero, V. J. The Journal of Physical Chemistry A, Vol. 110, Issue 18 https://doi.org/10.1021/jp057182+	journal	April 2006
Laser wavelength effects on the charge state resolved ion energy distributions from laser-produced Sn plasma Burdt, Russell A.; Tao, Yezheng; Tillack, Mark S. Journal of Applied Physics, Vol. 107, Issue 4 https://doi.org/10.1063/1.3309413	journal	February 2010
Theoretical and experimental study of the microwave cut-off probe for electron density measurements in low-temperature plasmas Li, Bin; Li, Hong; Wang, Huihui Journal of Applied Physics, Vol. 110, Issue 7 https://doi.org/10.1063/1.3647760	journal	October 2011
Nonlinear plasma wave in magnetized plasmas Bulanov, Sergei V.; Zh. Esirkepov, Timur; Kando, Masaki Physics of Plasmas, Vol. 20, Issue 8 https://doi.org/10.1063/1.4817949	journal	August 2013
Low pressure hydrogen discharges diluted with argon explored using a global model Hjartarson, A. T.; Thorsteinsson, E. G.; Gudmundsson, J. T. Plasma Sources Science and Technology, Vol. 19, Issue 6 https://doi.org/10.1088/0963-0252/19/6/065008	journal	November 2010
A volume-averaged model of nitrogen–hydrogen plasma chemistry to investigate ammonia production in a plasma-surface-interaction device Body, Thomas; Cousens, Samuel; Kirby, Juliet Plasma Physics and Controlled Fusion, Vol. 60, Issue 7 https://doi.org/10.1088/1361-6587/aab740	journal	June 2018
The Long Road to Maxwell's Equations Rautio, James IEEE Spectrum, Vol. 51, Issue 12 https://doi.org/10.1109/MSPEC.2014.6964925	journal	December 2014
Improved volume-averaged model for steady and pulsed-power electronegative discharges Kim, Sungjin; Lieberman, M. A.; Lichtenberg, A. J. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 24, Issue 6 https://doi.org/10.1116/1.2345645	journal	November 2006
In situ collector cleaning and extreme ultraviolet reflectivity restoration by hydrogen plasma for extreme ultraviolet sources Elg, Daniel T.; Sporre, John R.; Panici, Gianluca A. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 34, Issue 2 https://doi.org/10.1116/1.4942456	journal	March 2016
Study of a linear surface wave plasma source for tin removal in an extreme ultraviolet source Qerimi, Dren; Panici, Gianluca; Jain, Arihant Journal of Vacuum Science & Technology B, Vol. 38, Issue 5 https://doi.org/10.1116/6.0000200	journal	September 2020
Radical probe system for in situ measurements of radical densities of hydrogen, oxygen, and nitrogen Qerimi, Dren; Shchelkanov, Ivan; Panici, Gianluca Journal of Vacuum Science & Technology A, Vol. 39, Issue 2 https://doi.org/10.1116/6.0000786	journal	March 2021
Determination of recombination coefficients for hydrogen, oxygen, and nitrogen gasses via in situ radical probe system Qerimi, Dren; Panici, Gianluca; Jain, Arihant Journal of Vacuum Science & Technology A, Vol. 39, Issue 2 https://doi.org/10.1116/6.0000787	journal	March 2021
LPP EUV source readiness for NXE 3300B Brandt, David C.; Fomenkov, Igor V.; Farrar, Nigel R. SPIE Proceedings https://doi.org/10.1117/12.2048184	conference	March 2014
Performance of one hundred watt HVM LPP-EUV source Mizoguchi, Hakaru; Nakarai, Hiroaki; Abe, Tamotsu SPIE Proceedings https://doi.org/10.1117/12.2086347	conference	March 2015
Characterization of a novel double-gas-jet laser plasma EUV source de Bruijn, Rene; Bartnik, Andrzej; Fledderus, H. F. SPIE Proceedings https://doi.org/10.1117/12.390050	conference	July 2000
Energetic and thermal Sn interactions and their effect on EUVL source collector mirror lifetime at high temperatures Allain, J. P.; Nieto, M.; Hendricks, M. Advanced Lithography, SPIE Proceedings https://doi.org/10.1117/12.711270	conference	March 2007
LPP source system development for HVM Brandt, David C.; Fomenkov, Igor V.; Ershov, Alex I. SPIE Proceedings https://doi.org/10.1117/12.848404	conference	March 2010
EUV Lithography Bakshi, Vivek https://doi.org/10.1117/3.769214	book	December 2008
On Maxwell's Equations in an Electromagnetic Field with the Temperature Effect Yin, Hong-Ming SIAM Journal on Mathematical Analysis, Vol. 29, Issue 3 https://doi.org/10.1137/S0036141097316159	journal	July 1998
EUV Lithography: State-of-the-Art Review Fu, Nan; Liu, Yanxiang Journal of Microelectronic Manufacturing, Vol. 2, Issue 2 https://doi.org/10.33079/jomm.19020202	journal	January 2019

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Tin removal by an annular surface wave plasma antenna in an extreme ultraviolet lithography source

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