Use of wire grid polarizers with liquid crystal display for large-volume stereolithography

Rodriguez, Nicholas A.; Song, Hongtao; Chen, Morgan; Oakdale, James S.; Duoss, Eric B.; Seepersad, Carolyn C.; Crawford, Richard H.

doi:10.1016/j.addma.2022.102641

Use of wire grid polarizers with liquid crystal display for large-volume stereolithography

Journal Article · Fri Jan 28 23:00:00 EST 2022 · Additive Manufacturing

DOI:https://doi.org/10.1016/j.addma.2022.102641· OSTI ID:1879283

Rodriguez, Nicholas A. ^[1]; Song, Hongtao ^[2]; Chen, Morgan ^[2]; Oakdale, James S. ^[3]; Duoss, Eric B. ^[3]; Seepersad, Carolyn C. ^[2]; Crawford, Richard H. ^[2]

Univ. of Texas, Austin, TX (United States); Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Univ. of Texas, Austin, TX (United States)
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

Spatial light modulators that use liquid crystal devices (LCDs) to pattern ultraviolet light for vat polymerization suffer from a few limitations: limited range of wavelengths that can be patterned, low damage threshold for incoming light, and low efficiency of light transmission. A monochrome LCD can more efficiently transmit useful wavelengths of light for stereolithography (365–405 nm) than a color LCD, but it still contains two absorptive film polarizers that suffer from the aforementioned limitations. Wire grid polarizers reflect rather than absorb the blocked polarizations of light, resulting in a higher intensity damage threshold. They can also polarize lower wavelength light that is limited only by the wire pitch. In this work, this research investigates the effects of replacing an LCD’s film polarizers with wire grid polarizers to enable polarization and patterning of high intensity UV light, resulting in shorter curing times and the ability to print a wider range of stereolithography feedstocks.

View Accepted Manuscript (DOE)

Research Organization:: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA)

Grant/Contract Number:: AC52-07NA27344

OSTI ID:: 1879283

Report Number(s):: LLNL-JRNL-831192; 1047802

Journal Information:: Additive Manufacturing, Journal Name: Additive Manufacturing Vol. 52; ISSN 2214-8604

Publisher:: ElsevierCopyright Statement

Country of Publication:: United States

Language:: English

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