Three-Dimensional Nanostructures Formed by Single Step, Two-Photon Exposures through Elastomeric Penrose Quasicrystal Phase Masks
- Univ. of Illinois at Urbana-Champaign, IL (United States); Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); University of Illinois
- Univ. of Illinois at Urbana-Champaign, IL (United States); Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
We describe the fabrication of unusual classes of three-dimensional (3D) nanostructures using single step, two-photon exposures of photopolymers through elastomeric phase masks with 5-fold, Penrose quasicrystalline layouts. Confocal imaging, computational studies, and 3D reconstructions reveal the essential aspects of the flow of light through these quasicrystal masks. Here, the resulting nanostructures show interesting features, including quasicrystalline layouts in planes parallel to the sample surfaces, with completely aperiodic variations through their depths, consistent with the optics. Spectroscopic measurements of transmission and reflection provide additional insights.
- Research Organization:
- Univ. of Illinois at Urbana-Champaign, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division; USDOE National Nuclear Security Administration (NNSA)
- Grant/Contract Number:
- FG02-07ER46471; FG02-07ER46453; AC04-94AL85000
- OSTI ID:
- 1876446
- Journal Information:
- Nano Letters, Journal Name: Nano Letters Journal Issue: 8 Vol. 8; ISSN 1530-6984
- Publisher:
- American Chemical SocietyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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