In situ detection of RF breakdown on microfabricated surface ion traps

Wilson, Joshua M.; Tilles, Julia N.; Haltli, Raymond A.; Ou, Eric; Blain, Matthew G.; Clark, Susan M.; Revelle, Melissa C.

doi:10.1063/5.0082740

In situ detection of RF breakdown on microfabricated surface ion traps

Journal Article · Fri Apr 01 00:00:00 EDT 2022 · Journal of Applied Physics

DOI:https://doi.org/10.1063/5.0082740· OSTI ID:1870449

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Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

We report microfabricated surface ion traps are a principal component of many ion-based quantum information science platforms. The operational parameters of these devices are pushed to the edge of their physical capabilities as the experiments strive for increasing performance. When the applied radio-frequency (RF) voltage is increased excessively, the devices can experience damaging electric discharge events known as RF breakdown. We introduce two novel techniques for in situ detection of RF breakdown, which we implemented while characterizing the breakdown threshold of surface ion traps produced at Sandia National Laboratories. In these traps, breakdown did not always occur immediately after increasing the RF voltage, but often minutes or even hours later. This result is surprising in the context of the suggested mechanisms for RF breakdown in vacuum. Additionally, the extent of visible damage caused by breakdown events increased with the applied voltage. To minimize the probability for damage when RF power is first applied to a device, our results strongly suggest that the voltage should be ramped up over the course of several hours and monitored for breakdown.

View Accepted Manuscript (DOE)

Research Organization:: Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC), Advanced Scientific Computing Research (ASCR); Office of the Director of National Intelligence (ODNI)

Grant/Contract Number:: NA0003525

OSTI ID:: 1870449

Alternate ID(s):: OSTI ID: 1860533

Report Number(s):: SAND2022-4126J; 704513

Journal Information:: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 13 Vol. 131; ISSN 0021-8979

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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