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Measurements of OH radical concentrations in uniform and non-uniform nanosecond-pulsed dielectric barrier discharge plasma

Technical Report ·
DOI:https://doi.org/10.2172/1865889· OSTI ID:1865889
 [1];  [2]
  1. Drexel Univ., Philadelphia, PA (United States); U.S. Department of Energy
  2. Drexel Univ., Philadelphia, PA (United States)

In this work we studied OH radical generation in nanosecond dielectric barrier discharge in humid He/air gas. The measurements were carried out by means of laser-induced fluorescence (LIF) method at the PPPL Low Temperature Plasma Research Facility, directed by Dr. Shurik Yatom. Application of LIF towards OH density measurements is a widely used approach in plasmas generated in humid gas, particularly when temporal evolution of OH density is of interest. Here we examined the OH densities generated in the discharge ignited by application of nanosecond high-voltage pulses with amplitudes varying between 10 to 20 kV and interelectrode gap length varying between 0.5-3 mm. The peak voltage and the gap length determine the mode in which discharge is generated: homogenous or filamentary. The measurements of OH in the gas phase were accompanied by the measurements of hydrogen peroxide (H2O2) in liquid water, downstream of the plasma and the relationship between these two were examined.

Research Organization:
Drexel Univ., Philadelphia, PA (United States)
Sponsoring Organization:
USDOE Office of Environment, Health, Safety and Security (AU), Office of Environmental Protection and ES&H Reporting; USDOE Office of Science (SC), Fusion Energy Sciences (FES)
DOE Contract Number:
SC0021379
OSTI ID:
1865889
Report Number(s):
DOE-Drexel-SC0021379
Country of Publication:
United States
Language:
English

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