Atomic-resolution lithography with an on-chip scanning tunneling microscope

Alipour, Afshin; Fowler, Emma L.; Moheimani, S. O. Reza; Owen, James H. G.; Randall, John N.

doi:10.1116/6.0001826

Atomic-resolution lithography with an on-chip scanning tunneling microscope

Journal Article · Mon Apr 25 00:00:00 EDT 2022 · Journal of Vacuum Science and Technology B

DOI:https://doi.org/10.1116/6.0001826· OSTI ID:1864878

; ; ; Owen, James H. G.;

In this work, atomic-resolution lithography with a Microelectromechanical-System (MEMS) based Scanning Tunneling Microscope (STM) is demonstrated for the first time. The microscope consists of a commercial UltraHigh-Vacuum (UHV) STM whose regular tip is replaced with a 1-Degree-of-Freedom (1-DOF) MEMS nanopositioner. This results in a hybrid STM system where XY-plane motions are provided by the piezotube of the original system and Z-axis motion by the MEMS with a higher bandwidth. Sharp tips made of Pt or W are added to the MEMS devices with postfabrication techniques. With this hybrid system, STM-based lithography is demonstrated on an H-passivated Si (100)-2×1 sample under UHV condition. Results prove the capability of the hybrid STM system for atomic-scale lithography. This capability, paired with the small footprint of the MEMS device, makes this approach a candidate for building a high-throughput parallel STM lithography platform by incorporating an array of 1-DOF MEMS devices that perform lithography in parallel.

Sponsoring Organization:: USDOE

Grant/Contract Number:: EE0008322

OSTI ID:: 1864878

Journal Information:: Journal of Vacuum Science and Technology B, Journal Name: Journal of Vacuum Science and Technology B Journal Issue: 3 Vol. 40; ISSN 2166-2746

Publisher:: American Vacuum SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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