High frequency impedance characteristics of a tunable microplasma device

Gautam, Saurav; Morra, Gabriele; Venkattraman, Ayyaswamy

doi:10.1063/5.0041386

High frequency impedance characteristics of a tunable microplasma device

Journal Article · Fri Apr 16 00:00:00 EDT 2021 · Journal of Applied Physics

DOI:https://doi.org/10.1063/5.0041386· OSTI ID:1852790

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Univ. of California, Merced, CA (United States); Univ. of California, Merced, CA (United States)
Univ. of Louisiana, Lafayette, LA (United States)
Univ. of California, Merced, CA (United States)

Computational studies on high frequency impedance characteristics of a microplasma device are reported. While microplasma is ignited using a primary excitation signal, frequency response of plasma impedance is determined by a secondary high frequency probe signal with significantly lower voltage amplitude such that it does not influence the plasma parameters. Here, the computational model utilizing the drift–diffusion approximation is first validated by comparing with experimental data for microplasmas ignited at pressures ranging from 1 to 5 Torr. In spite of quantitative discrepancies, good overall agreement is obtained between the measured frequency response of impedance of the discharge. Comparisons are also presented for various plasma parameters including mean electron number density, sheath thickness, mean electron temperature, and collision frequency that were inferred from the impedance measurements. The computational model is then used to perform simulations of near-atmospheric pressure microplasmas with the probe signal frequency ranging from 3 to 20 GHz. The simulations demonstrate the presence of a resonance frequency at which the impedance vanishes. More importantly, it is shown that this resonant frequency can be tuned effectively by suitably modifying the operating parameters (gap size, pressure, and excitation voltage). The simulated impedance characteristics are used to determine the effective plasma inductance and capacitance using a non-linear fitting approach, thereby showing the dependence of these electrical parameters on the plasma operating conditions.

View Accepted Manuscript (DOE)

Research Organization:: Univ. of California, Merced, CA (United States)

Sponsoring Organization:: National Science Foundation (NSF); USDOE; USDOE Office of Science (SC), Fusion Energy Sciences (FES)

Grant/Contract Number:: SC0019044

OSTI ID:: 1852790

Alternate ID(s):: OSTI ID: 1777647

Journal Information:: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 15 Vol. 129; ISSN 0021-8979

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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High frequency impedance characteristics of a tunable microplasma device

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