Direct current microplasma formation around microstructure arrays

Fu, Yangyang; Wang, Huihui; Zheng, Bocong; Zhang, Peng; Fan, Qi Hua; Wang, Xinxin; Verboncoeur, John P.

doi:10.1063/5.0046312

Direct current microplasma formation around microstructure arrays

Journal Article · Mon Apr 26 00:00:00 EDT 2021 · Applied Physics Letters

DOI:https://doi.org/10.1063/5.0046312· OSTI ID:1850774

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Tsinghua University, Beijing (China). Department of Electrical Engineering; Tsinghua Univ., Beijing (China)
EMD Performance Materials, Tempe, AZ (United States)
Michigan State University, East Lansing, MI (United States). Fraunhofer Center for Coatings and Diamond Technologies
Michigan State University, East Lansing, MI (United States). Department of Electrical and Computer Engineering
Michigan State University, East Lansing, MI (United States). Fraunhofer Center for Coatings and Diamond Technologies; Michigan State University, East Lansing, MI (United States). Department of Electrical and Computer Engineering; Michigan State University, East Lansing, MI (United States). Department of Chemical Engineering and Materials Science
Tsinghua University, Beijing (China). Department of Electrical Engineering
Michigan State University, East Lansing, MI (United States). Department of Electrical and Computer Engineering; Michigan State University, East Lansing, MI (United States). Department of Computational Mathematics, Science and Engineering

We demonstrate the formation and transition behaviors of a microplasma around microstructure arrays at different gas pressures via two-dimensional particle-in-cell/Monte Carlo collision simulations. It is found that the microdischarge occurs outside the cathode microcavities at the lowest pressure and starts penetrating the microcavities with a curved sheath edge as the pressure increases. At higher pressure, coupled periodic microhollow cathode discharges (MHCDs) are formed inside the microcavities. Further increasing the gas pressure results in the disappearance of the MHCDs, and the dominant discharge shifts outside of the microcavity, locating above the protrusion tips. The effect of the space charge shielding on the discharge and the conditions for MHCD formation are discussed. The macroscopic discharge parameter scalings with the gas pressure and the electron kinetics are also examined. The results are helpful for deeply understanding the microplasma formation with nonplanar electrodes, which inform the scaling, design, and optimization of microplasma array devices across a wide range of pressure regimes in practical applications.

View Accepted Manuscript (DOE)

Research Organization:: Univ. of Michigan, Ann Arbor, MI (United States)

Sponsoring Organization:: National Natural Science Foundation of China (NSFC); National Science Foundation (NSF); US Air Force Office of Scientific Research (AFOSR); USDOE; USDOE Office of Science (SC), Fusion Energy Sciences (FES)

Grant/Contract Number:: SC0001939

OSTI ID:: 1850774

Alternate ID(s):: OSTI ID: 1780509

Journal Information:: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 17 Vol. 118; ISSN 0003-6951

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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