Multi defect detection and analysis of electron microscopy images with deep learning
Journal Article
·
· Computational Materials Science
- Univ. of Wisconsin, Madison, WI (United States)
- Hope College, Holland, MI (United States)
- Univ. of Puerto Rico at Mayagüez (Puerto Rico)
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Univ. of Michigan, Ann Arbor, MI (United States)
Electron microscopy is widely used to explore defects in crystal structures, but human detecting of defects is often time-consuming, error-prone, and unreliable, and is not scalable to large numbers of images or real-time analysis. In this work, we discuss the application of machine learning approaches to find the location and geometry of different defect clusters in irradiated steels. We show that a deep learning based Faster R-CNN analysis system has a performance comparable to human analysis with relatively small training data sets. Furthermore, this study proves the promising ability to apply deep learning to assist the development of automated microscopy data analysis even when multiple features are present and paves the way for fast, scalable, and reliable analysis systems for massive amounts of modern electron microscopy data.
- Research Organization:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE; USDOE Office of Nuclear Energy (NE)
- Grant/Contract Number:
- AC05-00OR22725
- OSTI ID:
- 1845761
- Alternate ID(s):
- OSTI ID: 1811600
- Journal Information:
- Computational Materials Science, Journal Name: Computational Materials Science Vol. 199; ISSN 0927-0256
- Publisher:
- ElsevierCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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