System and method for stimulated emission depletion projection stereolithography

Patent · Tue Jul 27 00:00:00 EDT 2021

OSTI ID:1840289

Hensleigh, Ryan; Moran, Bryan D.; Jackson, Julie A.; Duoss, Eric B.; Kelly, Brett; Shusteff, Maxim; Taylor, Hayden; Spadaccini, Christopher M.

The present disclosure relates to a system for forming a three dimensional (3D) part. The system may incorporate a beam delivery subsystem for generating optical signals, and a mask subsystem that receives the optical signals and generates optical images therefrom. A first one of the optical images activates a polymerization species of a photo-sensitive resin in accordance with illuminated areas thereof, to thus cause polymerization of select portions of the photo-sensitive resin to help form a layer of the 3D part. A second one of the optical images causes stimulated emission depletion of subportions of the polymerization species, simultaneously, over various areas of the layer, to enhance resolution of at least one subportion of the select portions of the photo-sensitive resin.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC52-07NA27344
• Assignee: Lawrence Livermore National Security, LLC (Livermore, CA); The Regents of the University of California (Oakland, CA)
• Patent Number(s): 11,072,160
• Application Number: 15/244,605
• OSTI ID: 1840289
• Country of Publication: United States
• Language: English