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Reaching the Excitonic Limit in 2D Janus Monolayers by In Situ Deterministic Growth

Journal Article · · Advanced Materials
 [1];  [1];  [2];  [2];  [3];  [1];  [1];  [2];  [1];  [1];  [3];  [2];  [1]
  1. Materials Science and Engineering School for Engineering of Matter Transport and Energy Arizona State University Tempe AZ 85287 USA
  2. Cavendish Laboratory University of Cambridge J. J. Thomson Avenue Cambridge CB3 0HE UK
  3. Department of Physics Arizona State University Tempe AZ 85287 USA
Abstract

Named after the two‐faced Roman god of transitions, transition metal dichalcogenide (TMD) Janus monolayers have two different chalcogen surfaces, inherently breaking the out‐of‐plane mirror symmetry. The broken mirror symmetry and the resulting potential gradient lead to the emergence of quantum properties such as the Rashba effect and the formation of dipolar excitons. Experimental access to these quantum properties, however, hinges on the ability to produce high‐quality 2D Janus monolayers. Here, these results introduce a holistic 2D Janus synthesis technique that allows real‐time monitoring of the growth process. This prototype chamber integrates in situ spectroscopy, offering fundamental insights into the structural evolution and growth kinetics, that allow the evaluation and optimization of the quality of Janus monolayers. The versatility of this method is demonstrated by synthesizing and monitoring the conversion of SWSe, SNbSe, and SMoSe Janus monolayers. Deterministic conversion and real‐time data collection further aid in conversion of exfoliated TMDs to Janus monolayers and unparalleled exciton linewidth values are reached, compared to the current best standard. The results offer an insight into the process kinetics and aid in the development of new Janus monolayers with high optical quality, which is much needed to access their exotic properties.

Research Organization:
Arizona State University, Tempe, AZ (United States)
Sponsoring Organization:
Engineering and Physical Sciences Research Council (EPSRC); Faraday Institution; National Science Foundation (NSF); Royal Society University Research Fellowship; USDOE; USDOE Office of Science (SC)
Grant/Contract Number:
SC0020653
OSTI ID:
1837093
Alternate ID(s):
OSTI ID: 1837095
OSTI ID: 1976198
Journal Information:
Advanced Materials, Journal Name: Advanced Materials Journal Issue: 6 Vol. 34; ISSN 0935-9648
Publisher:
Wiley Blackwell (John Wiley & Sons)Copyright Statement
Country of Publication:
Germany
Language:
English

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