Phonon engineering of boron nitride via isotopic enrichment
Journal Article
·
· Journal of Materials Research
- Vanderbilt Univ., Nashville, TN (United States)
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States). Center for Integrated Nanotechnologies (CINT)
- Vanderbilt Univ., Nashville, TN (United States); Univ. of Iowa, Iowa City, IA (United States)
- National Institute for Materials Science (NIMS), Tsukuba (Japan). Research Center for Functional Materials
- Fisk Univ., Nashville, TN (United States). Center for Photonic Materials and Devices
- National Institute for Materials Science (NIMS), Tsukuba (Japan). International Center for Materials Nanoarchitectonics
Phonon polaritons (PhPs) enable a variety of applications, yet it requires PhPs supported in the desired frequency range. The two BN allotropes (cubic and hexagonal, cBN and hBN) are of particular interest, as their optic phonons fall within the so-called molecular-fingerprint region (~ 1000–1610 cm-1). However, there remains a spectral gap between PhPs covered by these two, limiting applications. Thus, we isotopically engineered hBN and cBN and examined the optic phonons. Furthermore, for hBN, enhancement of the optic phonon lifetimes and shifted frequencies are observed. However, lifetimes are observed to decrease with the enrichment of cBN by 10B, 11B, and 15N. We propose that the reduced lifetimes are not due to intrinsic loss, but rather increased defect concentrations resulting from the modified growth, supported by first-principles calculations. Thus, reducing the extrinsic defects in isotopically engineered cBN may present a path toward overcoming these restrictions for applications in the molecular-fingerprint region.
- Research Organization:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- MEXT; National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- AC02-05CH11231; AC05-00OR22725; NA0003525
- OSTI ID:
- 1833973
- Journal Information:
- Journal of Materials Research, Journal Name: Journal of Materials Research Journal Issue: 21 Vol. 36; ISSN 0884-2914
- Publisher:
- Materials Research SocietyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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