Micro-trench measurements of the net deposition of carbon impurity ions in the DIII-D divertor and the resulting suppression of surface erosion
- Princeton Univ., NJ (United States)
- Princeton Plasma Physics Lab. (PPPL), Princeton, NJ (United States)
- Univ. of California, San Diego, CA (United States)
- General Atomics, San Diego, CA (United States)
- Univ. of Tennessee, Knoxville, TN (United States)
- Rutgers Univ., Piscataway, NJ (United States)
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
In this work, we report carbon impurity ion incident angles and deposition rates, along with silicon erosion rates, from measurements of micro-engineered trenches on a silicon surface exposed to L-mode deuterium plasmas at the DIII-D divertor. Post exposure ex-situ analysis determined elemental maps and concentrations, carbon deposition thicknesses, and erosion of silicon surfaces. Carbon deposition profiles on the trench floor showed carbon ion shadowing that was consistent with ERO calculations of average carbon ion angle distributions (IADs) for both polar and azimuthal angles. Measured silicon net erosion rates negatively correlated with the deposited carbon concentration at different locations. Differential erosion of surfaces on two different ion-downstream trench slope structures suggested that carbon deposition rate is affected by the carbon ion incident angle and significantly suppressed the surface erosion. The results suggest the C impurity ion incident angles, determined by the IADs and surface morphology, strongly affect erosion rates as well as the main ion (D, T, He) incident angles.
- Research Organization:
- Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States); Sandia National Laboratories, SNL California
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC), Fusion Energy Sciences (FES); National Science Foundation (NSF)
- Grant/Contract Number:
- NA0003525; AC02-09CH11466; FC02-04ER54698; AC52-07NA27344; FG02-07ER54917
- OSTI ID:
- 1827617
- Alternate ID(s):
- OSTI ID: 1877328
- Report Number(s):
- SAND--2021-12749J; 700851
- Journal Information:
- Physica Scripta, Journal Name: Physica Scripta Journal Issue: 12 Vol. 96; ISSN 0031-8949
- Publisher:
- IOP PublishingCopyright Statement
- Country of Publication:
- United States
- Language:
- English