Enhancement of van der Waals Interlayer Coupling through Polar Janus MoSSe

Zhang, Kunyan; Guo, Yunfan; Ji, Qingqing; Lu, Ang-Yu; Su, Cong; Wang, Hua; Puretzky, Alexander A.; Geohegan, David B.; Qian, Xiaofeng; Fang, Shiang; Kaxiras, Efthimios; Kong, Jing; Huang, Shengxi

doi:10.1021/jacs.0c07051

Enhancement of van der Waals Interlayer Coupling through Polar Janus MoSSe

Journal Article · Thu Sep 17 00:00:00 EDT 2020 · Journal of the American Chemical Society

DOI:https://doi.org/10.1021/jacs.0c07051· OSTI ID:1823364

^[1]; Guo, Yunfan ^[2]; ^[2]; Lu, Ang-Yu ^[2]; ^[2]; Wang, Hua ^[3]; ^[4]; ^[4]; ^[3]; Fang, Shiang ^[5]; Kaxiras, Efthimios ^[6]; ^[2]; ^[1]

Pennsylvania State Univ., University Park, PA (United States)
Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
Texas A & M Univ., College Station, TX (United States)
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Rutgers Univ., Piscataway, NJ (United States)
Harvard Univ., Cambridge, MA (United States)

Interlayer coupling plays essential roles in the quantum transport, polaritonic, and electrochemical properties of stacked van der Waals (vdW) materials. In this work, we report the unconventional interlayer coupling in vdW heterostructures (HSs) by utilizing an emerging 2D material, Janus transition metal dichalcogenides (TMDs). In contrast to conventional TMDs, monolayer Janus TMDs have two different chalcogen layers sandwiching the transition metal and thus exhibit broken mirror symmetry and an intrinsic vertical dipole moment. Such a broken symmetry is found to strongly enhance the vdW interlayer coupling by as much as 13.2% when forming MoSSe/MoS₂ HS as compared to the pristine MoS₂ counterparts. Our noncontact ultralow-frequency Raman probe, linear chain model, and density functional theory calculations confirm the enhancement and reveal the origins as charge redistribution in Janus MoSSe and reduced interlayer distance. Furthermore, our results uncover the potential of tuning interlayer coupling strength through Janus heterostacking.

View Accepted Manuscript (DOE)

Research Organization:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: AC05-00OR22725

OSTI ID:: 1823364

Journal Information:: Journal of the American Chemical Society, Journal Name: Journal of the American Chemical Society Journal Issue: 41 Vol. 142; ISSN 0002-7863

Publisher:: American Chemical Society (ACS)Copyright Statement

Country of Publication:: United States

Language:: English

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