Impact of 2D–3D Heterointerface on Remote Epitaxial Interaction through Graphene
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- Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States); Massachusetts Institute of Technology
- Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
- Sungkyunkwan Univ., Suwon (Republic of Korea)
- Cornell Univ., Ithaca, NY (United States)
- Cornell Univ., Ithaca, NY (United States); Kavli Institute at Cornell for Nanoscale Science, Ithaca, NY (United States)
- Yonsei Univ., Seoul (Korea, Republic of)
- Korea Atomic Energy Research Institute, Daejeon (Korea, Republic of)
- Pennsylvania State Univ., University Park, PA (United States)
- Ajou Univ., Suwon (Korea, Republic of)
- Cornell Univ., Ithaca, NY (United States); Kavli Institute at Cornell for Nanoscale Science, Ithaca, NY (United States); Leibniz Inst. for Crystal Growth (IKZ), Berlin (Germany)
Remote epitaxy has drawn attention as it offers epitaxy of functional materials that can be released from the substrates with atomic precision, thus enabling production and heterointegration of flexible, transferrable, and stackable freestanding single-crystalline membranes. In addition, the remote interaction of atoms and adatoms through two-dimensional (2D) materials in remote epitaxy allows investigating and utilizing electrical/chemical/physical coupling of bulk (3D) materials via 2D materials (3D-2D-3D coupling). Here, we unveil the respective roles and impacts of the substrate material, graphene, substrate-graphene interface, and epitaxial material for electrostatic coupling of these materials, which governs cohesive ordering and can lead to single-crystal epitaxy in the overlying film. Further, we show that simply coating a graphene layer on wafers does not guarantee successful implementation of remote epitaxy, since atomically precise control of the graphene-coated interface is required, and provide key considerations for maximizing the remote electrostatic interaction between the substrate and adatoms. This was enabled by exploring various material systems and processing conditions, and we demonstrate that the rules of remote epitaxy vary significantly depending on the ionicity of material systems as well as the graphene-substrate interface and the epitaxy environment. The general rule of thumb discovered here enables expanding 3D material libraries that can be stacked in freestanding form.
- Research Organization:
- Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
- Sponsoring Organization:
- Defense Advanced Research Projects Agency (DARPA); National Science Foundation (NSF); US Air Force Office of Scientific Research (AFOSR); USDOE Office of Energy Efficiency and Renewable Energy (EERE), Renewable Power Office. Solar Energy Technologies Office
- Grant/Contract Number:
- EE0008558
- OSTI ID:
- 1811213
- Journal Information:
- ACS Nano, Journal Name: ACS Nano Journal Issue: 6 Vol. 15; ISSN 1936-0851
- Publisher:
- American Chemical Society (ACS)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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