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Title: Unraveling the Atomic Structure of Bulk Binary Ga–Te Glasses with Surprising Nanotectonic Features for Phase-Change Memory Applications

Journal Article · · ACS Applied Materials and Interfaces
 [1];  [2]; ORCiD logo [3];  [1];  [4];  [5]; ORCiD logo [1];  [5]; ORCiD logo [4]
  1. Laboratoire de Physico-Chimie de l’Atmosphère, Université du Littoral Côte d’Opale, 59140 Dunkerque, France
  2. Institute of Chemistry, St. Petersburg State University, 198504 St. Petersburg, Russia
  3. X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, United States
  4. Laboratoire de Physico-Chimie de l’Atmosphère, Université du Littoral Côte d’Opale, 59140 Dunkerque, France, ILIT RAS−Branch of the FSRC “Crystallography and Photonics” RAS, 140700 Shatura, Moscow Region, Russia
  5. ILIT RAS−Branch of the FSRC “Crystallography and Photonics” RAS, 140700 Shatura, Moscow Region, Russia

Binary Ge-Te and ternary Ge-Sb-Te systems belong to flagship phase-change materials (PCMs) and are used in nonvolatile memory applications and neuromorphic computing. The working temperatures of these PCMs are limited by low-T glass transition and crystallization phenomena. Promising high-T PCMs may include gallium tellurides; however, the atomic structure and transformation processes for amorphous Ga-Te binaries are simply missing. Using high-energy X-ray diffraction and Raman spectroscopy supported by first-principles simulations, we elucidate the short- and intermediate-range order in bulk glassy GaxTe1-x, 0.17 ≤ x ≤ 0.25, following their thermal, electric, and optical properties, revealing a semiconductor-metal transition above melting. We also show that a phase change in binary Ga-Te is characterized by a very unusual nanotectonic compression with the high internal transition pressure reaching 4-8 GPa, which appears to be beneficial for PCM applications increasing optical and electrical contrast between the SET and RESET states and decreasing power consumption.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
AC02-06CH1135; AC02-06CH11357
OSTI ID:
1810592
Alternate ID(s):
OSTI ID: 1828848
Journal Information:
ACS Applied Materials and Interfaces, Journal Name: ACS Applied Materials and Interfaces Vol. 13 Journal Issue: 31; ISSN 1944-8244
Publisher:
American Chemical SocietyCopyright Statement
Country of Publication:
United States
Language:
English

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