The sub-band structure of atomically sharp dopant profiles in silicon
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June 2020 |
Chemical approaches for doping nanodevice architectures
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July 2016 |
Electrical characterization of an ultrahigh concentration boron delta‐doping layer
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August 1994 |
Mechanism of Phosphorus Transport Through Silicon Oxide During Phosphonic Acid Monolayer Doping
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April 2018 |
Contact Doping of Silicon Wafers and Nanostructures with Phosphine Oxide Monolayers
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October 2012 |
Importance of Monolayer Quality for Interpreting Current Transport through Organic Molecules: Alkyls on Oxide-Free Si
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August 2006 |
Interactions of B dopant atoms and Si interstitials with SiO2 films during annealing for ultra-shallow junction formation
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April 2005 |
Atomically Precise Placement of Single Dopants in Si
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September 2003 |
Synthesis and structural characterization of SiBOC ceramic fibers derived from single-source polyborosiloxane
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May 2011 |
Monolayer Doping of Silicon through Grafting a Tailored Molecular Phosphorus Precursor onto Oxide-Passivated Silicon Surfaces
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May 2016 |
Covalently Attached Monolayers on Hydrogen-Terminated Si(100): Extremely Mild Attachment by Visible Light
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March 2004 |
Characterization of a boro-silicon oxynitride prepared by thermal nitridation of a polyborosiloxane
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January 1996 |
Functionalization of SiO 2 Surfaces for Si Monolayer Doping with Minimal Carbon Contamination
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January 2018 |
Synthesis and characterization of P δ -layer in SiO 2 by monolayer doping
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January 2016 |
Full Activation of Boron in Silicon Doped by Self-Assembled Molecular Monolayers
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December 2019 |
Organometallic Chemistry on Silicon and Germanium Surfaces
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May 2002 |
Doping reaction of PH 3 and B 2 H 6 with Si(100)
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June 1986 |
Self assembled monolayers on silicon for molecular electronics
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May 2006 |
Growth and structural analysis of an ordered boron monolayer in Si(100)
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November 1992 |
Controlled nanoscale doping of semiconductors via molecular monolayers
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November 2007 |
Wafer-Scale, Sub-5 nm Junction Formation by Monolayer Doping and Conventional Spike Annealing
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January 2009 |
Functionalization of Silica Nanoparticles and Native Silicon Oxide with Tailored Boron-Molecular Precursors for Efficient and Predictive p -Doping of Silicon
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June 2015 |
Monolayer Contact Doping from a Silicon Oxide Source Substrate
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April 2017 |
Toward Defect-Free Doping by Self-Assembled Molecular Monolayers: The Evolution of Interstitial Carbon-Related Defects in Phosphorus-Doped Silicon
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February 2019 |
Iridium-Catalyzed Preparation of Silylboranes by Silane Borylation and Their Use in the Catalytic Borylation of Arenes
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October 2008 |
Core-electron binding energies for compounds of boron, carbon, and chromium
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March 1970 |
Bipolar device fabrication using a scanning tunnelling microscope
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July 2020 |
Reaction of BCl3 with H- and Cl-terminated Si(1 0 0) as a pathway for selective, monolayer doping through wet chemistry
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December 2020 |
Alkyl Monolayers on Silicon Prepared from 1-Alkenes and Hydrogen-Terminated Silicon
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March 1995 |
Formation and Structure of Self-Assembled Monolayers
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January 1996 |
Boosting the Boron Dopant Level in Monolayer Doping by Carboranes
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December 2015 |
Characterization of metallic impurities in Si using a recombination-lifetime correlation method
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October 1997 |
Covalently Attached Monolayers on Hydrogen-Terminated Si(100): Extremely Mild Attachment by Visible Light
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journal
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March 2004 |