Enhanced antiferromagnetic resonance linewidth in NiO/Pt and NiO/Pd

Moriyama, Takahiro; Hayashi, Kensuke; Yamada, Keisuke; Shima, Mutsuhiro; Ohya, Yutaka; Tserkovnyak, Yaroslav; Ono, Teruo

doi:10.1103/physrevb.101.060402

Enhanced antiferromagnetic resonance linewidth in NiO/Pt and NiO/Pd

Journal Article · Tue Feb 04 00:00:00 EST 2020 · Physical Review B

DOI:https://doi.org/10.1103/physrevb.101.060402· OSTI ID:1802317

^[1]; Hayashi, Kensuke ^[2]; ^[2]; Shima, Mutsuhiro ^[2]; Ohya, Yutaka ^[2]; Tserkovnyak, Yaroslav ^[3]; Ono, Teruo ^[4]

Kyoto Univ. (Japan); OSTI
Gifu University (Japan)
Univ. of California, Los Angeles, CA (United States)
Kyoto Univ. (Japan)

In this paper, we investigate the enhancement of the antiferromagnetic damping in the sintered NiO-HM (where HM is heavy metal) granular systems having NiO/HM interfaces, where HM = Pt or Pd. Under the assumption of the spin pumping model, we derive the effective interfacial damping conductance g eff , the parameter which characterizes the upper-bound estimate of the spin pumping effect, to be 12 ± 1 nm^₋2 and 5 ± 1 nm^₋2 for the NiO/Pt and the NiO/Pd interfaces, respectively, at room temperature. We report $$g_{\text{eff}}$$ experimentally derived in this study are an important milestone in antiferromagnetic spintronics, giving a guideline for various spin current transfer and spin interaction phenomena with antiferromagnets where the spin mixing conductance is involved.

View Accepted Manuscript (DOE)

Research Organization:: Univ. of California, Los Angeles, CA (United States)

Sponsoring Organization:: Japan Society for the Promotion of Science (JSPS); USDOE; USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division

Grant/Contract Number:: SC0012190

OSTI ID:: 1802317

Alternate ID(s):: OSTI ID: 1599519

Journal Information:: Physical Review B, Journal Name: Physical Review B Journal Issue: 6 Vol. 101; ISSN 2469-9950

Publisher:: American Physical Society (APS)Copyright Statement

Country of Publication:: United States

Language:: English

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