High-throughput synthesis and corrosion behavior of sputter-deposited nanocrystalline Alx(CoCrFeNi)100-x combinatorial high-entropy alloys
- Chinese Academy of Sciences, Shenzhen (China). Schenzhen Inst. of Advanced Technology
- Univ. of Science and Technology, Beijing (China). Collaborative Innovation Center of Steel Technology
- Univ. of Tennessee, Knoxville, TN (United States). Dept. of Materials Science and Engineering; Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
- Univ. of Tennessee, Knoxville, TN (United States). Dept. of Materials Science and Engineering
High-entropy alloys (HEAs) are inherently complex and potentially span a vast composition space, making their research and discovery challenging. In the present study, high-throughput synthesis of an Alx(CoCrFeNi)100-x combinatorial material library covering x = 4.5–40 atomic percent Al is achieved, using magnetron cosputtering. The effects of Al on the microstructure and corrosion behavior are investigated. With the increased amount of Al, crystal-structures of thin films transform from face-centered cubic (FCC) to body-centered cubic (BCC). Both the FCC and BCC thin films demonstrate a uniform elemental distribution. Corrosion characteristics of combinatorial samples immersed in the 3.5 wt% (wt%) NaCl solution are evaluated via electrochemical tests. Complementary X-ray photoelectron spectroscopy analysis reveals the compositional variation of passivated films formed on the sample surface after immersion. The results show that the Alx(CoCrFeNi)100-x HEA thin films possess outstanding corrosion-resistant properties, but the resistance diminishes with the increasing Al content. The decreased corrosion resistance is revealed to be directly related to the constituents of passivated films.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE Office of Fossil Energy (FE)
- Grant/Contract Number:
- 51901242; 2018M643247; DMR-1611180; 1809640; CBET-1603780; 2162026; JCYJ20160608153641020; JCYJ20180507182239617; FE-0008855; FE-0011194; FE-0024054
- OSTI ID:
- 1785699
- Journal Information:
- Materials & Design, Vol. 195; ISSN 0264-1275
- Publisher:
- ElsevierCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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