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U.S. Department of Energy
Office of Scientific and Technical Information

Long-Term PCT of ILAW Glasses (FY2019)

Technical Report ·
DOI:https://doi.org/10.2172/1784548· OSTI ID:1784548
 [1];  [1];  [2]
  1. The Catholic Univ. of America, Washington, DC (United States)
  2. Washington River Protection Solutions, Richland, WA (United States)

About 50 million gallons of high-level mixed waste is currently stored in underground tanks at The United States Department of Energy’s (DOE’s) Hanford site in the State of Washington. The Hanford Tank Waste Treatment and Immobilization Plant (WTP) will provide DOE’s Office of River Protection (ORP) with a means of treating this waste by vitrification for subsequent disposal. The tank waste will be separated into low- and high-activity waste fractions, which will then be vitrified respectively into Immobilized Low Activity Waste (ILAW) and Immobilized High Level Waste (IHLW) products. The ILAW product will be disposed in an engineered facility – the Integrated Disposal Facility (IDF) – on the Hanford site, while the IHLW product is designed for deep geological disposal in a national facility for high-level nuclear waste. The ILAW and IHLW products must meet a variety of requirements with respect to protection of the environment before they can be accepted for disposal. The objective of the work described in this report is to perform testing, data collection, and analyses for the ILAW glass product for subsequent use in the performance assessment (PA) of the IDF to assess potential environmental risks associated with long-term storage.

Research Organization:
Washington River Protection Solutions, Richland, WA (United States); The Catholic Univ. of America, Washington, DC (United States); USDOE Office of River Protection (ORP), Richland, WA (United States)
Sponsoring Organization:
USDOE Office of Environmental Management (EM)
DOE Contract Number:
AC27-08RV14800
OSTI ID:
1784548
Report Number(s):
WRPS--66072; VSL--19R4620-1
Country of Publication:
United States
Language:
English

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