Phase-shifted Bragg gratings in a foundry silicon nitride platform

Husko, Chad; Ducharme, Andrew; Fahrenkopf, Nicholas M.; Guest, Jeffrey R.

doi:10.1364/OSAC.413672

Phase-shifted Bragg gratings in a foundry silicon nitride platform

Journal Article · Wed Mar 03 00:00:00 EST 2021 · OSA Continuum

DOI:https://doi.org/10.1364/OSAC.413672· OSTI ID:1769179

; ; Fahrenkopf, Nicholas M.; Guest, Jeffrey R.

Bragg gratings are key optical elements for applications in communications, sensing, and lasers. Phase-shifted Bragg gratings are a special case where the simple periodic structure is altered to allow a narrow spectral passband within the optical bandgap. Here, we demonstrate phase-shifted silicon nitride gratings fabricated using 193 nm deep ultraviolet lithography (DUV) on the AIM Photonics 300 mm silicon photonics foundry line. We measure the grating properties and verify the results with a transfer-matrix method (TMM) model. The standard grating expressions for extracting the coupling coefficient κ and bandwidth do not apply and are updated to account for the phase shift. These results inform future designs for on-chip grating filters and distributed feedback (DFB) lasers.

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Sponsoring Organization:: USDOE

Grant/Contract Number:: AC02-06CH11357; SC0014664

OSTI ID:: 1769179

Journal Information:: OSA Continuum, Journal Name: OSA Continuum Journal Issue: 3 Vol. 4; ISSN 2578-7519

Publisher:: Optical Society of AmericaCopyright Statement

Country of Publication:: United States

Language:: English

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