In-Cu alloy substrates for low-temperature chemical vapor deposition of Mo2C

Journal Article · Mon Dec 21 00:00:00 EST 2020 · Journal of Vacuum Science and Technology A

DOI:https://doi.org/10.1116/6.0000735· OSTI ID:1737716

Young, Katherine T. ; Smith, Colter; Hitchcock, Dale A. ; Vogel, Eric M.

Two-dimensional transition metal carbides are promising materials because of their potential for combining the favorable properties of transition metal carbides with the high aspect ratio of two-dimensional materials. Though commonly produced by top-down wet-chemical synthesis methods, synthesis by chemical vapor deposition is being considered because of its ability to achieve large areas, controlled layer thickness, and reduced defect density. Typically, liquid Cu is used as a synthesis substrate, though the high melting temperature of Cu (1085 °C) requires high synthesis temperatures. Thus, alternative substrates have been studied in order to reduce the necessary melting temperature. This work systematically studies the impact of synthesis parameters and substrate composition on the growth of ultrathin Mo2C (∼4–120 nm thick) by chemical vapor deposition on an In-Cu alloy. Mo2C flake size increases, and graphene/Mo2C heterostructures form with an increase in the methane flow rates. Increasing the In composition slightly decreases surface coverage and coalescence but does not appreciably impact the Mo2C flake size. Increasing In content also decreases the alloy substrate melting temperature so that a lower temperature synthesis (800 °C) can be performed. However, the necessary high temperatures for pyrolysis of methane lead to a lower limit for the synthesis temperature, similar to graphene.

• Sponsoring Organization: USDOE
• Grant/Contract Number: Contract Agreement 1695955; LDRD-2020-00065
• OSTI ID: 1737716
• Journal Information: Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Vol. 39 Journal Issue: 1; ISSN 0734-2101
• Publisher: American Vacuum Society
• Country of Publication: United States
• Language: English