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Tailored Graphene Micropatterns by Wafer-Scale Direct Transfer for Flexible Chemical Sensor Platform

Journal Article · · Advanced Materials
 [1];  [2];  [3];  [2];  [4];  [2];  [2];  [2];  [2];  [2];  [5];  [6];  [2];  [2];  [2]
  1. Los Alamos National Lab. (LANL), Los Alamos, NM (United States); Seoul National Univ. (Korea, Republic of)
  2. Seoul National Univ. (Korea, Republic of)
  3. Korea Inst. of Materials Science, Changwon (Korea, Republic of)
  4. Korea Basic Science Inst., Daejeon (Korea, Republic of )
  5. Kangwon National Univ., Samcheok (Korea, Republic of)
  6. Korea Univ. Seoul (Korea, Republic of)

2D materials, such as graphene, exhibit great potential as functional materials for numerous novel applications due to their excellent properties. The grafting of conventional micropatterning techniques on new types of electronic devices is required to fully utilize the unique nature of graphene. However, the conventional lithography and polymer-supported transfer methods often induce the contamination and damage of the graphene surface due to polymer residues and harsh wet-transfer conditions. In this work, a novel strategy to obtain micropatterned graphene on polymer substrates using a direct curing process is demonstrated. Employing this method, entirely flexible, transparent, well-defined self-activated graphene sensor arrays, capable of gas discrimination without external heating, are fabricated on 4 in. wafer-scale substrates. Finite element method simulations show the potential of this patterning technique to maximize the performance of the sensor devices when the active channels of the 2D material are suspended and nanoscaled. This study contributes considerably to the development of flexible functional electronic devices based on 2D materials.

Research Organization:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division; USDOE National Nuclear Security Administration (NNSA); National Research Foundation of Korea (NRF)
Grant/Contract Number:
89233218CNA000001
OSTI ID:
1734733
Alternate ID(s):
OSTI ID: 1804217
Report Number(s):
LA-UR--20-29018
Journal Information:
Advanced Materials, Journal Name: Advanced Materials Journal Issue: 2 Vol. 33; ISSN 0935-9648
Publisher:
WileyCopyright Statement
Country of Publication:
United States
Language:
English

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  • Secor, Ethan B.; Prabhumirashi, Pradyumna L.; Puntambekar, Kanan
  • The Journal of Physical Chemistry Letters, Vol. 4, Issue 8, p. 1347-1351 https://doi.org/10.1021/jz400644c
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