Order-disorder processes fundamentally determine the structure and properties of many important oxide systems for energy and computing applications. While these processes have been intensively studied in bulk materials, they are less investigated and understood for nanostructured oxides in highly non-equilibrium conditions. These systems can now be realized through a range of deposition techniques and probed at exceptional spatial and chemical resolution, leading to a greater focus on interface dynamics. In this work, we survey a selection of recent studies of order-disorder behavior at thin film oxide interfaces, with a particular emphasis on the emergence of order during synthesis and disorder in extreme irradiation environments. We summarize key trends and identify directions for future study in this growing research area.
Spurgeon, Steven R.. "Order-disorder behavior at thin film oxide interfaces." Current Opinion in Solid State and Materials Science, vol. 24, no. 6, Nov. 2020. https://doi.org/10.1016/j.cossms.2020.100870
Spurgeon, Steven R. (2020). Order-disorder behavior at thin film oxide interfaces. Current Opinion in Solid State and Materials Science, 24(6). https://doi.org/10.1016/j.cossms.2020.100870
Spurgeon, Steven R., "Order-disorder behavior at thin film oxide interfaces," Current Opinion in Solid State and Materials Science 24, no. 6 (2020), https://doi.org/10.1016/j.cossms.2020.100870
@article{osti_1713197,
author = {Spurgeon, Steven R.},
title = {Order-disorder behavior at thin film oxide interfaces},
annote = {Order-disorder processes fundamentally determine the structure and properties of many important oxide systems for energy and computing applications. While these processes have been intensively studied in bulk materials, they are less investigated and understood for nanostructured oxides in highly non-equilibrium conditions. These systems can now be realized through a range of deposition techniques and probed at exceptional spatial and chemical resolution, leading to a greater focus on interface dynamics. In this work, we survey a selection of recent studies of order-disorder behavior at thin film oxide interfaces, with a particular emphasis on the emergence of order during synthesis and disorder in extreme irradiation environments. We summarize key trends and identify directions for future study in this growing research area.},
doi = {10.1016/j.cossms.2020.100870},
url = {https://www.osti.gov/biblio/1713197},
journal = {Current Opinion in Solid State and Materials Science},
issn = {ISSN 1359-0286},
number = {6},
volume = {24},
place = {United States},
publisher = {Elsevier},
year = {2020},
month = {11}}
Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)
Sponsoring Organization:
USDOE Laboratory Directed Research and Development (LDRD) Program; USDOE Office of Science (SC), Biological and Environmental Research (BER)
Grant/Contract Number:
AC05-76RL01830
OSTI ID:
1713197
Report Number(s):
PNNL-SA--154843
Journal Information:
Current Opinion in Solid State and Materials Science, Journal Name: Current Opinion in Solid State and Materials Science Journal Issue: 6 Vol. 24; ISSN 1359-0286