Continuous, real time microwave plasma element sensor
Microwave-induced plasma is described for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy and a shorted waveguide made of a microwave conductive, refractory material communicating with the source of the microwave energy to generate a plasma. The high power waveguide is constructed to be robust in a hot, hostile environment. It includes an aperture for the passage of gases to be analyzed and a spectrometer is connected to receive light from the plasma. Provision is made for real time in situ calibration. The spectrometer disperses the light, which is then analyzed by a computer. The sensor is capable of making continuous, real time quantitative measurements of desired elements, such as the heavy metals lead and mercury. 3 figs.
- Research Organization:
- Battelle Memorial Institute, Columbus, OH (United States)
- DOE Contract Number:
- AC06-76RL01830
- Assignee:
- PTO; SCA: 400102; PA: EDB-96:028717; SN: 96001517597
- Patent Number(s):
- US 5,479,254/A/
- Application Number:
- PAN: 8-141,857
- OSTI ID:
- 170445
- Resource Relation:
- Other Information: PBD: 26 Dec 1995
- Country of Publication:
- United States
- Language:
- English
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