Continuous, real time microwave plasma element sensor

Patent · Tue Dec 26 04:00:00 EST 1995

OSTI ID:170445

Woskov, P P; Smatlak, D L; Cohn, D R; Wittle, J K; Titus, C H; Surma, J E

Microwave-induced plasma is described for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy and a shorted waveguide made of a microwave conductive, refractory material communicating with the source of the microwave energy to generate a plasma. The high power waveguide is constructed to be robust in a hot, hostile environment. It includes an aperture for the passage of gases to be analyzed and a spectrometer is connected to receive light from the plasma. Provision is made for real time in situ calibration. The spectrometer disperses the light, which is then analyzed by a computer. The sensor is capable of making continuous, real time quantitative measurements of desired elements, such as the heavy metals lead and mercury. 3 figs.

• Research Organization: Battelle Memorial Institute
• DOE Contract Number: AC06-76RL01830
• Assignee: PTO; SCA: 400102; SN: 96001517597; PA: EDB-96:028717
• Patent Number(s): US 5,479,254/A/
• Application Number: PAN: 8-141,857
• OSTI ID: 170445
• Country of Publication: United States
• Language: English

Related Subjects

40 CHEMISTRY
DESIGN
GAS ANALYSIS
LEAD
MERCURY
MICROWAVE EQUIPMENT
PLASMA PRODUCTION
QUANTITATIVE CHEMICAL ANALYSIS
REAL TIME SYSTEMS
WAVEGUIDES