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Catalytically mediated epitaxy of 3D semiconductors on van der Waals substrates

Journal Article · · Applied Physics Reviews
DOI:https://doi.org/10.1063/5.0006300· OSTI ID:1677679
 [1];  [2];  [3];  [4];  [5];  [6];  [6];  [2];  [7];  [8]
  1. Univ. of Cambridge (United Kingdom); IBM, Yorktown Heights, NY (United States). Thomas J. Watson Research Center
  2. Technical Univ. of Denmark, Lyngby (Denmark)
  3. Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
  4. Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States); Harvard Univ., Cambridge, MA (United States)
  5. Brookhaven National Lab. (BNL), Upton, NY (United States)
  6. IBM, Yorktown Heights, NY (United States). Thomas J. Watson Research Center
  7. Univ. of Cambridge (United Kingdom)
  8. IBM, Yorktown Heights, NY (United States). Thomas J. Watson Research Center; Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
The formation of well-controlled interfaces between materials of different structure and bonding is a key requirement when developing new devices and functionalities. Of particular importance are epitaxial or low defect density interfaces between two-dimensional materials and three-dimensional semiconductors or metals, where an interfacial structure influences electrical conductivity in field effect and optoelectronic devices, charge transfer for spintronics and catalysis, and proximity-induced superconductivity. Epitaxy and hence well-defined interfacial structure has been demonstrated for several metals on van der Waals-bonded substrates. Semiconductor epitaxy on such substrates has been harder to control, for example during chemical vapor deposition of Si and Ge on graphene. Here, we demonstrate a catalytically mediated het-eroepitaxy approach to achieve epitaxial growth of three-dimensional semiconductors such as Ge and Si on van der Waals-bonded materials such as graphene and hexagonal boron nitride. Epitaxy is "transferred" from the substrate to semiconductor nanocrystals via solid metal nano-crystals that readily align on the substrate and catalyze the formation of aligned nuclei of the semiconductor. In situ transmission electron microscopy allows us to elucidate the reaction pathway for this process and to show that solid metal nanocrystals can catalyze semiconductor growth at a significantly lower temperature than direct chemical vapor deposition or deposition mediated by liquid catalyst droplets. We discuss Ge and Si growth as a model system to explore the details of such hetero-interfacing and its applicability to a broader range of materials.
Research Organization:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Organization:
Engineering and Physical Sciences Research Council (EPSRC); European Research Council (ERC); USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Grant/Contract Number:
SC0012704
OSTI ID:
1677679
Report Number(s):
BNL-219973-2020--JAAM
Journal Information:
Applied Physics Reviews, Journal Name: Applied Physics Reviews Journal Issue: 3 Vol. 7; ISSN 1931-9401
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English

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