Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Polish Academy of Sciences (PAS), Krakow (Poland); Foundation for Fundamental Research on Matter (FOM), Nieuwegein (The Netherlands)
- Academy of Sciences of the Czech Republic, Prague (Czech Republic)
- Academy of Sciences of the Czech Republic, Prague (Czech Republic); Czech Technical Univ. in Prague (Czech Republic)
- European X-ray Free-Electron Laser (XFEL), Hamburg (Germany)
- SLAC National Accelerator Lab., Menlo Park, CA (United States)
Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.
- Research Organization:
- SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States). Linac Coherent Light Source (LCLS); Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES); Foundation for Fundamental Research on Matter (FOM); Nederlandse Organisatie voor Wetenschappelijk Onderzoek (NWO); Ministry of Science and Higher Education; Czech Ministry of Education; Academy of Sciences of the Czech Republic
- Grant/Contract Number:
- AC02-76SF00515; AC52-07NA27344; LC510; LC528; LA08024; ME10046; Z10100523; IAA400100701; IAAX00100903; KAN300100702
- OSTI ID:
- 1672142
- Journal Information:
- Optics Express, Vol. 18, Issue 23; ISSN 1094-4087
- Publisher:
- Optical Society of America (OSA)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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