skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser

Journal Article · · Optics Express
DOI:https://doi.org/10.1364/oe.18.023933· OSTI ID:1672142
 [1];  [1];  [1];  [1];  [1];  [2];  [3];  [4];  [3];  [5];  [6];  [6];  [6];  [6];  [6]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
  2. Polish Academy of Sciences (PAS), Krakow (Poland); Foundation for Fundamental Research on Matter (FOM), Nieuwegein (The Netherlands)
  3. Academy of Sciences of the Czech Republic, Prague (Czech Republic)
  4. Academy of Sciences of the Czech Republic, Prague (Czech Republic); Czech Technical Univ. in Prague (Czech Republic)
  5. European X-ray Free-Electron Laser (XFEL), Hamburg (Germany)
  6. SLAC National Accelerator Lab., Menlo Park, CA (United States)

Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.

Research Organization:
SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States). Linac Coherent Light Source (LCLS); Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES); Foundation for Fundamental Research on Matter (FOM); Nederlandse Organisatie voor Wetenschappelijk Onderzoek (NWO); Ministry of Science and Higher Education; Czech Ministry of Education; Academy of Sciences of the Czech Republic
Grant/Contract Number:
AC02-76SF00515; AC52-07NA27344; LC510; LC528; LA08024; ME10046; Z10100523; IAA400100701; IAAX00100903; KAN300100702
OSTI ID:
1672142
Journal Information:
Optics Express, Vol. 18, Issue 23; ISSN 1094-4087
Publisher:
Optical Society of America (OSA)Copyright Statement
Country of Publication:
United States
Language:
English

References (13)

Morphology, microstructure, stress and damage properties of thin film coatings for the LCLS x-ray mirrors conference May 2009
Multiple pulse thermal damage thresholds of materials for x-ray free electron laser optics investigated with an ultraviolet laser journal November 2008
The soft x-ray free-electron laser FLASH at DESY: beamlines, diagnostics and end-stations journal February 2009
Near-Ultraviolet Luminescence of N 2 Irradiated by Short X-Ray Pulses journal July 2010
Damage of amorphous carbon induced by soft x-ray femtosecond pulses above and below the critical angle journal July 2009
Soft-x-ray free-electron-laser interaction with materials journal October 2007
X-Ray Interactions: Photoabsorption, Scattering, Transmission, and Reflection at E = 50-30,000 eV, Z = 1-92 journal July 1993
Measurement of x-ray free-electron-laser pulse energies by photoluminescence in nitrogen gas journal March 2008
Unified model of secondary electron cascades in diamond journal March 2005
Damage threshold of inorganic solids under free-electron-laser irradiation at 32.5nm wavelength journal April 2007
Simple technique for measurements of pulsed Gaussian-beam spot sizes journal January 1982
Wavelength dependence of the damage threshold of inorganic materials under extreme-ultraviolet free-electron-laser irradiation journal September 2009
Measurements and Simulations of Ultralow Emittance and Ultrashort Electron Beams in the Linac Coherent Light Source journal June 2009

Cited By (13)

Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser text January 2018
Linac Coherent Light Source soft x-ray materials science instrument optical design and monochromator commissioning journal September 2011
Ablation and transmission of thin solid targets irradiated by intense extreme ultraviolet laser radiation journal September 2016
Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser journal January 2018
Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold journal January 2018
Preparation and characterization of B 4 C coatings for advanced research light sources journal January 2016
Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser text January 2018
X-ray induced damage of B4C-coated bilayer materials under various irradiation conditions journal February 2019
Femtosecond X-ray induced changes of the electronic and magnetic response of solids from electron redistribution journal November 2019
X-ray induced damage of B$_4$C-coated bilayer materials under various irradiation conditions text January 2019
Characterizing the intrinsic properties of individual XFEL pulses via single-particle diffraction journal January 2020
X-ray induced damage of B$_4$C-coated bilayer materials under various irradiation conditions text January 2019
Damage threshold of coating materials on x-ray mirror for x-ray free electron laser journal May 2016

Similar Records

Multiple pulse thermal damage thresholds of materials for x-ray free electron laser optics investigated with an ultraviolet laser
Journal Article · Mon Nov 17 00:00:00 EST 2008 · Applied Physics Letters · OSTI ID:1672142

Reflection of attosecond x-ray free electron laser pulses
Journal Article · Mon Oct 30 00:00:00 EST 2006 · Review of Scientific Instruments, vol. 78, N/A, January 10, 2007, pp. 013104 · OSTI ID:1672142

Reflection of attosecond x-ray free electron laser pulses
Journal Article · Mon Jan 15 00:00:00 EST 2007 · Review of Scientific Instruments · OSTI ID:1672142