Fast Organic Vapor Phase Deposition of Thin Films in Light-Emitting Diodes

Qu, Boning; Ding, Kan; Sun, Kai; Hou, Shaocong; Morris, Steven; Shtein, Max; Forrest, Stephen R.

doi:10.1021/acsnano.0c07017

Fast Organic Vapor Phase Deposition of Thin Films in Light-Emitting Diodes

Journal Article · Mon Oct 05 00:00:00 EDT 2020 · ACS Nano

DOI:https://doi.org/10.1021/acsnano.0c07017· OSTI ID:1670700

Qu, Boning ^[1]; Ding, Kan ^[2]; ^[2]; Hou, Shaocong ^[2]; Morris, Steven ^[2]; Shtein, Max ^[2]; ^[2]

Univ. of Michigan, Ann Arbor, MI (United States); University of Michigan
Univ. of Michigan, Ann Arbor, MI (United States)

Fast deposition of thin films is essential for achieving low-cost, high throughput phosphorescent organic light emitting diode (PHOLED) production. In this work, we demonstrate rapid and uniform growth of semiconductor thin films by organic vapor phase deposition (OVPD). A green PHOLED comprising an emission layer (EML) grown at 50 Å/s with bis[2-(2-pyridinyl-N)phenyl-C](acetylacetonato)iridium(III) (Ir(ppy)2(acac)) doped into 4,4 bis(N-carbazolyl)-1,1zolylld (CBP) exhibits a maximum external quantum efficiency of 20 ± 1%. The morphology, charge transport properties, and radiative efficiency under optical and electrical excitation of the PHOLED EML are investigated as functions of the deposition rate via both experimental and theoretical approaches. The EML shows no evidence for gas phase nucleation of the organic molecules at deposition rates as high as 50 Å/s. However, the roll-off in quantum efficiency at high current progressively increases with deposition rate due to enhanced triplet-polaron annihilation. The roll-off results from accumulation of stress within the PHOLED EML that generates a high density of defect states. Here, the defects, in turn, act as recombination sites for triplets and hole polarons, leading to enhanced triplet-polaron annihilation at high current. We introduce a void nucleation model to describe the film morphology evolution that is observed using electron microscopy.

View Accepted Manuscript (DOE)

Research Organization:: University of Michigan, Ann Arbor, MI (United States)

Sponsoring Organization:: USDOE Office of Energy Efficiency and Renewable Energy (EERE)

Grant/Contract Number:: EE0008723

OSTI ID:: 1670700

Journal Information:: ACS Nano, Journal Name: ACS Nano Journal Issue: 10 Vol. 14; ISSN 1936-0851

Publisher:: American Chemical Society (ACS)Copyright Statement

Country of Publication:: United States

Language:: English

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42 ENGINEERING
OLED
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defects
deposition
deposition rate
gas phase nucleation
layers
nucleation
stress
thin film stress

Fast Organic Vapor Phase Deposition of Thin Films in Light-Emitting Diodes

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