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Title: Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering

Journal Article · · MRS Communications
DOI:https://doi.org/10.1557/mrc.2018.195· OSTI ID:1656502
 [1];  [1];  [1];  [1];  [1];  [1];  [1];  [2];  [3];  [3]
  1. Pennsylvania State Univ., University Park, PA (United States)
  2. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)
  3. Pennsylvania State Univ., University Park, PA (United States); Pennsylvania State Univ., University Park, PA (United States). Materials Research Inst.

Resonant soft x-ray scattering (RSoXS) leverages chemical specificity to characterize thin films but is limited near the nitrogen edge. The challenge is that commercially available x-ray transparent substrates are composed of Si3N4 and thereby absorb incident x-rays and generate incoherent fluorescence. To overcome this challenge, we designed and fabricated Al2O3 free-standing films for use as RSoXS windows. Al2O3 films offer higher x-ray transmittance and minimal fluorescence near the nitrogen edge. As an example, Al2O3 windows allow for nitrogen RSoXS of conjugated block copolymer thin films that reveal domain spacings, which are not apparent with commercially available Si3N4 substrates.

Research Organization:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES); National Science Foundation (NSF)
Grant/Contract Number:
AC02-05CH11231; MRI-1626566
OSTI ID:
1656502
Journal Information:
MRS Communications, Vol. 9, Issue 01; ISSN 2159-6859
Publisher:
Materials Research Society - Cambridge University PressCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 5 works
Citation information provided by
Web of Science

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