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Title: Structural and electrical properties of (La,Nd){sub 2}(Cu,Ni)O{sub 4+{delta}}

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.46801· OSTI ID:165404
;  [1];  [2]
  1. Korea Research Institute of Chemical Technology, Yooseong, P.O. Box 107, Daedeog-Dangi, Daejeon (Korea, Republic of)
  2. Seoul National University, San 56-1, Shinlim-Dong, Kwanak-Gu, Seoul (Korea, Republic of)

The temperature dependence of electrical properties for K{sub 2}NiF{sub 4} type oxide, La{sub 2}Cu{sub 1{minus}{ital x}}Ni{sub {ital x}}O{sub 4+{delta}} and La{sub 1.8}Nd{sub 0.2}Cu{sub 1{minus}{ital x}}Ni{sub {ital x}}O{sub 4+{delta}} ({ital x}=0.0, 0.025, 0.05, 0.10, and 0.20), were investigated between R.T and 1173 K in view of potential thermoelectric material. Structural studies were made using a Rietveld pattern fitting refinement with X-ray powder diffraction data. Lattice parameter in {ital c} axis decreases with Ni content, while {ital a} increases and {ital b} is almost invariant. The electrical conductivity increases with a substitution of Ni ion in Cu sites, showing the transition between quasi-metallic and semiconducting. However, the absolute value of 5 and 10 mol % Ni-doped composition are lower than that of un-doped La{sub 2}CuO{sub 4+{delta}}. The thermoelectric power decreases continuously with Ni content. These behaviors were considered to an ability of Ni ion for incorporating an excess oxygen owing to the easier accessibility of Ni{sup 3+} and deleting of the local Cu 3d band by 3d{sup 8} configuration of Ni{sup 2+}. Power factors with doping of Ni are not enhanced. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.

Sponsoring Organization:
USDOE
OSTI ID:
165404
Report Number(s):
CONF-940830-; ISSN 0094-243X; TRN: 96:002078
Journal Information:
AIP Conference Proceedings, Vol. 316, Issue 1; Conference: 13. international conference on thermoelectrics, Kansas City, MO (United States), 30 Aug - 1 Sep 1994; Other Information: PBD: 10 Aug 1994
Country of Publication:
United States
Language:
English