High Temperature Sealants and Gaskets in Nuclear Applications

Journal Article · Wed Jun 29 00:00:00 EDT 2016 · Transactions of the American Nuclear Society

OSTI ID:1644742

Carrillo, Elisa N. ^[1]; Ramana, Chintalapalle V. ^[1]; Brown, Erik ^[2]; Mitchell, Mark ^[2]

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1. Univ. of Texas at El Paso, TX (United States)
2. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

LLNL has been conducting research to develop and deploy advances in ceramic filter technology to benefit nuclear facilities. There is a need for better materials for HEPA filters, especially those able to withstand moisture and higher temperatures as experienced in fire conditions. One of the next steps in this process is the improvement of the system sealants and gaskets. Current commercial filters use fluid seals and urethane gasket seals. Although these seals are sufficient for the minimum requirements of existing nuclear facilities, they will not be sufficient as improvements in ceramic filters and pre-filters reach their full potential. Currently, HEPA filters can only survive up to 1000°F (exhaust air) and 500°F (supply air) for less than 2 hours. Our research at the University of Texas at El Paso reviewed hundreds of sealant and gasket materials to identify improved sealants and gaskets that can be used in existing filters as well as ceramic HEPA filters and prefilters. Results of the research will be supplied to support the relevant code, ASME AG-1, in particular Section FO.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE National Nuclear Security Administration (NNSA)
• Grant/Contract Number: AC52-07NA27344
• OSTI ID: 1644742
• Report Number(s): LLNL-JRNL--696260; 826187
• Journal Information: Transactions of the American Nuclear Society, Journal Name: Transactions of the American Nuclear Society Journal Issue: 1 Vol. 115; ISSN 0003-018X
• Publisher: American Nuclear Society
• Country of Publication: United States
• Language: English

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