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Assembly of Disordered Cocontinuous Morphologies by Multiblock Copolymers with Random Block Sequence and Length Dispersity

Journal Article · · ACS Applied Polymer Materials
 [1];  [2];  [2];  [2]
  1. Univ. of Massachusetts, Amherst, MA (United States); University of Massachusetts Amherst
  2. Univ. of Massachusetts, Amherst, MA (United States)

Among the wide variety of nanostructures accessible by self-assembly of block copolymers, cocontinuous morphologies are of great interest for separations, catalysis, sensing, and energy storage due to their ability to integrate distinct properties of the constituent polymers. Furthermore, we investigate the tendency to form disordered cocontinuous phases of multiblock copolymers (MBCs) with random block sequence and length dispersity prepared by step-growth polymerization of pre-made telechelic polymers, specifically using thiol-Michael addition between diacrylate functionalized polystyrene (PS) and poly (D,L - lactide) (PLA) chains and a small molecule dithiol. In the phase diagram so established, disordered cocontinuous nanostructures occupy a wide window (≈ 25 % vol) at a modest segregation strength of χN = 15, close to the critical value for microphase separation. At a higher segregation strength of χN = 30, only a moderately wide (≈ 10 vol %) cocontinuous window is found, with MBCs instead tending to form ordered nanostructures. Although the breadth of the cocontinuous widow is less than that found in prior work on analogous randomly end-linked copolymer networks (RECNs), the MBC architecture offers offsetting advantages in terms of solution and melt processability.

Research Organization:
Univ. of Massachusetts, Amherst, MA (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
SC0016208
OSTI ID:
1638927
Journal Information:
ACS Applied Polymer Materials, Journal Name: ACS Applied Polymer Materials Journal Issue: 8 Vol. 2; ISSN 2637-6105
Publisher:
ACS PublicationsCopyright Statement
Country of Publication:
United States
Language:
English

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