Grid-assisted magnetron sputtering deposition of nitrogen graded TiN thin films

da Silva, F C.; Tunes, Matheus; Edmondson, Philip D.; Lima, N B.; Sagas, J C.; Fontana, L C.; Schon, Claudio

doi:10.1007/s42452-020-2617-3

Title: Grid-assisted magnetron sputtering deposition of nitrogen graded TiN thin films

Journal Article · Thu Apr 09 00:00:00 EDT 2020 · SN Applied Sciences

DOI:https://doi.org/10.1007/s42452-020-2617-3· OSTI ID:1616822

^[1]; Tunes, Matheus ^[2];

^[3]; Lima, N B. ^[4]; Sagas, J C. ^[5]; Fontana, L C. ^[5]; Schon, Claudio ^[6]

Escola Politecnica da Univ. de Sao Paulo (Brazil); Centro Estadual de Educação Tecnológica Paula Souza (CEETEPS), Cotia (Brazil)
Montanuniversitaet Leoben (Austria)
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science & Technology Division
Comissao Nacional de Energia Nuclear, Sao Paulo (Brazil)
Univ. do Estado de Santa Catarina, Joinville (Brazil)
Escola Politecnica da Univ. de Sao Paulo (Brazil)

Titanium Nitride (TiN) films were obtained using the grid-assisted magnetron sputtering deposition technique on Al substrates in two conditions: under constant and variable nitrogen concentration along the thin solid film thickness. The formation of a film with variable N concentration (herein referred as graded film) was confirmed using energy filtered transmission electron microscopy, X-ray photoelectron spectroscopy and grazing incidence X-ray diffraction. The TiN thin films microstructures were also analysed using scanning and transmission electron microscopies (SEM and TEM). Finally, the viability of synthesizing TiN thin films with variable N concentration is herein proposed as an alternative method for tailoring the properties of such functional coating materials.

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Research Organization:: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)

Sponsoring Organization:: USDOE; Brazilian National Research, Technology and Innovation Council (CNPq); Sao Paulo State Research Funding Foundation (FAPESP); Santa Catarina State Research Funding Agency (FAPESC)

Grant/Contract Number:: AC05-00OR22725; AC05-06OR23100; 312424/2013-2; 2016/05768-2; PAP-TR-655

OSTI ID:: 1616822

Journal Information:: SN Applied Sciences, Vol. 2, Issue 5; ISSN 2523-3963

Publisher:: Springer NatureCopyright Statement

Country of Publication:: United States

Language:: English

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