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A dual-bandwidth multilayer monochromator system

Conference ·
DOI:https://doi.org/10.1117/12.2324824· OSTI ID:1614751
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This paper reports on a planned upgrade to the capabilities of the Illinois Institute of Technology’s BioCAT undulator beamline in an effort to increase the photon flux 10 to 100-fold. This is accomplished by the addition of a double multilayer monochromator (MLM) system complementing the existing cryogenically-cooled double crystal silicon monochromator system. The water-cooled MLMs are designed and fabricated with each having two coated stripes to deliver a 12 keV undulator beam with either 1.0% or 0.5% energy bandwidths (BW). To simplify the mechanical design and operation of the MLM system, the two coatings have been designed with the same period thickness so that the BW selection is accomplished (at the same Bragg angle) by a mere horizontal translation of the MLMs. The challenge has been to find a pair of coatings that provide the desired BWs with high reflectivity at the same incident angle. This was achieved using MoSi2/B4C and Mo/MoSi2/B4C/MoS2 multilayers at an angle of 1.194°. The bandwidths and reflectivities attained are 0.52 and 83.33% for the former and 0.86 and 75.9% for the latter. Details are provided.
Research Organization:
Argonne National Laboratory (ANL)
Sponsoring Organization:
USDOE Office of Science - Office of Basic Energy Sciences; National Institutes of Health (NIH)
DOE Contract Number:
AC02-06CH11357
OSTI ID:
1614751
Country of Publication:
United States
Language:
English

References (1)

IMD—Software for modeling the optical properties of multilayer films journal January 1998

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Related Subjects

X-ray optics
multilayer
coating
tuning
reflectivity
bandwidth
side cooling